Substrate effects on the microsphere photolithography process (Conference Presentation)

Author(s):  
Chuang Qu ◽  
Edward C. Kinzel
2020 ◽  
Vol 96 (3s) ◽  
pp. 756-757
Author(s):  
Е.С. Шамин ◽  
Е.Л. Харченко

Данная работа посвящена описанию возможного алгоритма создания моделей резиста с постоянным порогом и расчета окон процесса на их основе. Приведенные изыскания реализованы в виде программного средства, использующего средства моделирования фотолитографии Mentor Graphics Calibre. This work is dedicated to the description of one of possible algorithms of constant threshold resist model generation used for photolithography process window calculation. This algorithm has been realized in the form of a program using Mentor Graphics Calibre modeling tools.


2016 ◽  
Vol 619 ◽  
pp. 112-119 ◽  
Author(s):  
E.L. Kossovich ◽  
F.M. Borodich ◽  
S.J. Bull ◽  
S.A. Epshtein

Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 10
Author(s):  
Alexander Kukaev ◽  
Dmitry Lukyanov ◽  
Denis Mikhailenko ◽  
Daniil Safronov ◽  
Sergey Shevchenko ◽  
...  

Originally, sensors based on surface acoustic waves are fabricated using photolithography, which becomes extremely expensive when a small series or even single elements are needed for the research. A laser thin film local evaporation technique is proposed to substitute the photolithography process in the production of surface acoustic wave based inertial sensors prototypes. To estimate its potential a prototype of a surface acoustic wave gyroscope sensing element was fabricated and tested. Its was shown that the frequency mismatch is no more than 1%, but dispersion of the wave on small inertial masses leads to a spurious parasitic signal on receiving electrodes. Possible ways of its neglecting is discussed.


2021 ◽  
Vol 133 ◽  
pp. 105936
Author(s):  
E. Tiras ◽  
S. Ardali ◽  
H.A. Firat ◽  
E. Arslan ◽  
E. Ozbay

Author(s):  
Rebecca C. DiPucchio ◽  
Karst E. Lenzen ◽  
Pargol Daneshmand ◽  
Maria B. Ezhova ◽  
Laurel L. Schafer

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