Large-area fabrication and characterisation of ultraviolet regime metamaterials manufactured using self-assembly techniques (Conference Presentation)

2016 ◽  
Author(s):  
William P. Wardley ◽  
Mazhar E. Nasir ◽  
Francisco J. Rodríguez Fortuño ◽  
Sébastien Vilain ◽  
Serena Skov Campbell ◽  
...  
Keyword(s):  
Self Assembly ◽  
Large Area

scholarly journals Towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing

Giant ◽  
2021 ◽  
pp. 100078
Author(s):  
Tao Wen ◽  
Bo Ni ◽  
Yuchu Liu ◽  
Wei Zhang ◽  
Zi-Hao Guo ◽  
...  
Keyword(s):  
Self Assembly ◽  
Line Pattern ◽  
Large Area

Engineering the shape of Zinc Oxide crystals via sonochemical or hydrothermal solution-based methods

2008 ◽  
Vol 1087 ◽  
Author(s):  
Marco Palumbo ◽  
Simon J. Henley ◽  
Thierry Lutz ◽  
Vlad Stolojan ◽  
David Cox ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Self Assembly ◽  
Hydrothermal Solution ◽  
Good Control ◽  
Transparent Conductors ◽  
Zno Nanostructures ◽  
Large Area ◽  
Light Emitting Devices ◽  
Wide Range ◽  
Solution Methods

AbstractRecent results in the use of Zinc Oxide (ZnO) nano/submicron crystals in fields as diverse as sensors, UV lasers, solar cells, piezoelectric nanogenerators and light emitting devices have reinvigorated the interest of the scientific community in this material. To fully exploit the wide range of properties offered by ZnO, a good understanding of the crystal growth mechanism and related defects chemistry is necessary. However, a full picture of the interrelation between defects, processing and properties has not yet been completed, especially for the ZnO nanostructures that are now being synthesized. Furthermore, achieving good control in the shape of the crystal is also a very desirable feature based on the strong correlation there is between shape and properties in nanoscale materials. In this paper, the synthesis of ZnO nanostructures via two alternative aqueous solution methods - sonochemical and hydrothermal - will be presented, together with the influence that the addition of citric anions or variations in the concentration of the initial reactants have on the ZnO crystals shape. Foreseen applications might be in the field of sensors, transparent conductors and large area electronics possibly via ink-jet printing techniques or self-assembly methods.

scholarly journals Hydrogen Electrocatalysis: Self‐Assembly of Large‐Area 2D Polycrystalline Transition Metal Carbides for Hydrogen Electrocatalysis (Adv. Mater. 50/2018)

2018 ◽  
Vol 30 (50) ◽  
pp. 1870385 ◽  
Author(s):  
Xining Zang ◽  
Wenshu Chen ◽  
Xiaolong Zou ◽  
J. Nathan Hohman ◽  
Lujie Yang ◽  
...  
Keyword(s):  
Transition Metal ◽  
Self Assembly ◽  
Metal Carbides ◽  
Large Area ◽  
Transition Metal Carbides

Electron Microscopy Study of Submicron Size Antiferromagnetic KMnF3 Nanoparticles and Their Self-assembly

2003 ◽  
Vol 775 ◽  
Author(s):  
Jeffrey Anderson ◽  
Rubi Garcia ◽  
Weilie L. Zhou
Keyword(s):  
Electron Microscopy ◽  
Self Assembly ◽  
Room Temperature ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Submicron Particles ◽  
Spherical Particles ◽  
Large Area ◽  
Homogeneous Crystal ◽  
Field Emission Electron Microscopy

AbstractSubmicron KMnF3 cubic and spherical nanoparticles were synthesized using the reverse micelle method. The nanostructures of the nanocrystals were studied by field emission electron microscopy and transmission electron microscopy. KMnF3 nanocrystals synthesized at room temperature started with cubic submicron particles (∼100 nm) and consisted of KMnF3 nanocrystallites (10-15 nm). As the reaction continued, the nanocrystals fused together and transformed into perfect cubic nanocrystals. Spherical beads composed of KMnF3 nanocrystallites were observed at low temperature synthesis. As the reaction continued, the spherical particles grew larger, however, no characteristic cubic shape of KMnF3 nanoparticles were observed. Even as they grew larger, there was no evidence of homogeneous crystal morphology as seen in the room temperature samples. Cubic shape KMnF3 nanocrystals were self-assembled into large area self-assembling patterns.

scholarly journals Self‐Assembly of Large‐Area 2D Polycrystalline Transition Metal Carbides for Hydrogen Electrocatalysis

2018 ◽  
Vol 30 (50) ◽  
pp. 1805188 ◽  
Author(s):  
Xining Zang ◽  
Wenshu Chen ◽  
Xiaolong Zou ◽  
J. Nathan Hohman ◽  
Lujie Yang ◽  
...  
Keyword(s):  
Transition Metal ◽  
Self Assembly ◽  
Metal Carbides ◽  
Large Area ◽  
Transition Metal Carbides

Rapid-flux-solvent-atmosphere method for tailoring the morphology of titania substrates over a large area via direct self-assembly of block copolymers

RSC Advances ◽  
2014 ◽  
Vol 4 (32) ◽  
pp. 16721-16725 ◽  
Author(s):  
Gianpaolo Chieffi ◽  
Rocco Di Girolamo ◽  
Antonio Aronne ◽  
Pasquale Pernice ◽  
Esther Fanelli ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Self Assembly ◽  
Hybrid Composite ◽  
Fast Method ◽  
Large Area ◽  
Composite Nanostructures

A fast method for the preparation of block-copolymer-based hybrid composite nanostructures and titania substrates well oriented over a large area, is illustrated.

Nanopatterning with UV Optical Lithography

MRS Bulletin ◽  
2005 ◽  
Vol 30 (12) ◽  
pp. 942-946 ◽  
Author(s):  
M. Rothschild ◽  
T. M. Bloomstein ◽  
N. Efremow ◽  
T. H. Fedynyshyn ◽  
M. Fritze ◽  
...  
Keyword(s):  
Self Assembly ◽  
State Of The Art ◽  
Uv Light ◽  
Semiconductor Industry ◽  
Optical Lithography ◽  
Large Area ◽  
Standard Process ◽  
Common Thread ◽  
Semiconductor Electronics ◽  
193 Nm

AbstractOptical lithography at ultraviolet (UV) wavelengths is the standard process for patterning 90-nm state-of-the-art devices in the semiconductor industry, and extensions to 45 nm and below are currently being explored. With such high resolution, the inherent high throughput of optical lithography will enable the development of a broad range of applications beyond semiconductor electronics. In this article, we will review progress toward nanopatterning with UV light in a variety of materials and geometries.The common thread is the use of short wavelengths, 193 nm or 157 nm, coupled with immersion to further reduce the effective wavelength. Densely spaced, 32-nm (and even smaller) features have been patterned, facilitating the future preparation of large-area, deeply scaled microelectronics, nanophotonics, nanobiology, and molecular-scale self-assembly.

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