Device characterization of the VCSEL-on-silicon as an on chip light source

Author(s):  
Myung-Joon Kwack ◽  
Ki-Seok Jang ◽  
Jiho Joo ◽  
Hyundai Park ◽  
Jin Hyuk Oh ◽  
...  
2021 ◽  
Vol 10 (1) ◽  
Author(s):  
Yoel Sebbag ◽  
Eliran Talker ◽  
Alex Naiman ◽  
Yefim Barash ◽  
Uriel Levy

AbstractRecently, there has been growing interest in the miniaturization and integration of atomic-based quantum technologies. In addition to the obvious advantages brought by such integration in facilitating mass production, reducing the footprint, and reducing the cost, the flexibility offered by on-chip integration enables the development of new concepts and capabilities. In particular, recent advanced techniques based on computer-assisted optimization algorithms enable the development of newly engineered photonic structures with unconventional functionalities. Taking this concept further, we hereby demonstrate the design, fabrication, and experimental characterization of an integrated nanophotonic-atomic chip magnetometer based on alkali vapor with a micrometer-scale spatial resolution and a magnetic sensitivity of 700 pT/√Hz. The presented platform paves the way for future applications using integrated photonic–atomic chips, including high-spatial-resolution magnetometry, near-field vectorial imaging, magnetically induced switching, and optical isolation.


2021 ◽  
Vol 903 ◽  
pp. 11-16
Author(s):  
M.A. Manjunath ◽  
K. Naveen ◽  
Prakash Vinod ◽  
N. Balashanmugam ◽  
M.R. Shankar

Polymethyl methacrylate (PMMA) is one among few known photo-polymeric resin useful in lithography for fabricating structures having better mechanical properties to meet the requirement in electronics and biomedical applications. This study explores the effect of Photo Initiator (PI) concentration and also curing time on strength and hardness of Polymethyl methacrylate (PMMA) obtained by UV photopolymerization of Methyl methacrylate (MMA) monomer. The UV LED light source operating at the wavelength of 364 nm is used with Benzoin Ethyl Ether (BEE) as photo initiator. The curing of PMMA resin is supported with peltier cooling device placed at the bottom of the UV light source. The characterisation study of UV photo cured PMMA is analysed through nano indenter (Agilent Technologies-G200). The current work investigates the influence of PI concentration and curing time in achieving maximum mechanical properties for UV photopolymerized PMMA.


2014 ◽  
pp. 69-92
Author(s):  
Takashi Sato ◽  
Hiromitsu Awano
Keyword(s):  

2016 ◽  
Vol 63 (8) ◽  
pp. 3205-3212 ◽  
Author(s):  
Qi Chen ◽  
Rui Ma ◽  
Wei Zhang ◽  
Fei Lu ◽  
Chenkun Wang ◽  
...  
Keyword(s):  

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