Spectrum method for laser induced damage in dielectric thin films

2015 ◽  
Author(s):  
Yue Cai ◽  
Meng-lian Zhou ◽  
Zhi-liang Ma ◽  
Li-jun Wang
Keyword(s):  
Thin Films ◽  
Dielectric Thin Films ◽  
Spectrum Method ◽  
Laser Induced Damage

Role of coating defects in laser‐induced damage to dielectric thin films

1973 ◽  
Vol 23 (11) ◽  
pp. 607-609 ◽  
Author(s):  
L. G. DeShazer ◽  
B. E. Newnam ◽  
K. M. Leung
Keyword(s):  
Thin Films ◽  
Dielectric Thin Films ◽  
Laser Induced Damage

Time-resolved holographic imaging of femtosecond laser-induced damage process in dielectric thin films

2016 ◽  
Author(s):  
Andrius Melninkaitis ◽  
Balys Momgaudis ◽  
Robertas Grigutis ◽  
Linas Smalakys ◽  
Nerijus Šiaulys ◽  
...  
Keyword(s):  
Thin Films ◽  
Femtosecond Laser ◽  
Dielectric Thin Films ◽  
Time Resolved ◽  
Holographic Imaging ◽  
Damage Process ◽  
Laser Induced Damage

The effect of the applied electric field on laser-induced damage of dielectric thin films

2017 ◽  
Vol 4 (1) ◽  
pp. 016403
Author(s):  
Shenjiang Wu ◽  
Junhong Su ◽  
Dangjuan Li ◽  
Junqi Xu ◽  
Satyananda Kar ◽  
...  
Keyword(s):  
Thin Films ◽  
Electric Field ◽  
Applied Electric Field ◽  
Dielectric Thin Films ◽  
Laser Induced Damage

Band gap energy and refractive index dependence of femtosecond laser induced damage threshold in dielectric thin films

2017 ◽  
Vol 636 ◽  
pp. 289-295 ◽  
Author(s):  
Hossein Shahrokhabadi ◽  
Majid Vaezzadeh ◽  
Alireza Bananej ◽  
Mohamad Hadi Maleki
Keyword(s):  
Thin Films ◽  
Refractive Index ◽  
Femtosecond Laser ◽  
Band Gap ◽  
Damage Threshold ◽  
Band Gap Energy ◽  
Dielectric Thin Films ◽  
Gap Energy ◽  
Laser Induced Damage

Finite-Element Modeling and Quantitative Measurement Using Scanning Microwave Microscopy to Characterize Dielectric Films

2018 ◽  
Author(s):  
K. A. Rubin ◽  
W. Jolley ◽  
Y. Yang
Keyword(s):  
Thin Films ◽  
Dielectric Film ◽  
Dielectric Constants ◽  
Dielectric Films ◽  
Silicon Substrates ◽  
Fem Modeling ◽  
Dielectric Thin Films ◽  
Microwave Microscopy ◽  
Scanning Microwave Microscopy ◽  
Low K

Abstract Scanning Microwave Impedance Microscopy (sMIM) can be used to characterize dielectric thin films and to quantitatively discern film thickness differences. FEM modeling of the sMIM response provides understanding of how to connect the measured sMIM signals to the underlying properties of the dielectric film and its substrate. Modeling shows that sMIM can be used to characterize a range of dielectric film thicknesses spanning both low-k and medium-k dielectric constants. A model system consisting of SiO2 thin films of various thickness on silicon substrates is used to illustrate the technique experimentally.

Tunable microwave mixing in nonlinear dielectric thin films of SrTiO3 and Sr0.5Ba0.5TiO3

1995 ◽  
Vol 31 (21) ◽  
pp. 1814-1815 ◽  
Author(s):  
A.T. Findikoglu ◽  
D.W. Reagor ◽  
Q.X. Jia ◽  
X.D. Wu
Keyword(s):  
Thin Films ◽  
Dielectric Thin Films ◽  
Nonlinear Dielectric ◽  
Tunable Microwave
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