Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

2015 ◽  
Author(s):  
Lina Shen ◽  
Sikun Li ◽  
Xiangzhao Wang ◽  
Guanyong Yan
2015 ◽  
Vol 35 (6) ◽  
pp. 0611003 ◽  
Author(s):  
沈丽娜 Shen Lina ◽  
李思坤 Li Sikun ◽  
王向朝 Wang Xiangzhao ◽  
闫观勇 Yan Guanyong

Optics ◽  
2021 ◽  
Vol 2 (2) ◽  
pp. 103-112
Author(s):  
Zhuohui Xu ◽  
Jinyun Zhou ◽  
Bo Wang ◽  
Ziming Meng

The projection lens is the core component of DMD-based maskless lithography and its imaging quality directly affects the transferal of exposure pattern. Based on the traditional projection lens system, we have designed diffractive optical element (DOE) and aspheric surfaces to optimize the refractive/diffractive hybrid projection lens system to improve its imaging quality. We found that the best effect is obtained when DOE is very close to the front lens group before the diaphragm of the hybrid system. Compared with the traditional projection lens system, this hybrid projection lens system has lower wave aberration with the help of DOE, and higher image quality owing to the modulation transfer function (MTF) value being improved. Finally, a hybrid projection lens system with working distance of 29.07 mm, image Space NA of 0.45, and total length of 196.97 mm is designed. We found that the maximum distortion and field curvature are 1.36 × 10−5% and 0.91 μm, respectively.


2020 ◽  
Vol 11 (3) ◽  
pp. 80-85
Author(s):  
Bekzod Bobomurodov ◽  
◽  
Dilfuza Akabirxodjayeva

This article has discussed the importance of information and communication technologies for the economy of Uzbekistan and the ongoing reforms in this area. The purpose of the study is to give suggestions and recommendations for the development of ICT in Uzbekistan. In the article, an analytical analysis of employment in the field of ICT has been accomplished.


Author(s):  
Brennan Davis ◽  
Wilson Chi

Abstract The use of an antireflection coating for backside semiconductor failure analysis is discussed. The process of selecting an appropriate coating is described. Several known coatings are also described in regards to imaging quality, material properties, and the benefits to device analysis applications.


2013 ◽  
Author(s):  
Jan Reimes ◽  
Marc Lepage ◽  
Frank Kettler ◽  
Jörg Zerlik ◽  
Frank Homann ◽  
...  

2009 ◽  
Vol 45 (4) ◽  
pp. 549-556 ◽  
Author(s):  
K. Lācis ◽  
◽  
A. Muižnieks ◽  
N. Jēkabsons ◽  
A. Rudevičs ◽  
...  

2020 ◽  
Vol 1671 ◽  
pp. 012006
Author(s):  
C A Ramírez ◽  
M Holguin ◽  
E Rivas-Trujillo
Keyword(s):  

Sign in / Sign up

Export Citation Format

Share Document