Effects of surface ligands and solvents on quantum dot photostability under pulsed UV laser irradiation

Author(s):  
Victor A. Krivenkov ◽  
Pavel S. Samokhvalov ◽  
Pavel A. Linkov ◽  
Sergey D. Prokhorov ◽  
Igor L. Martynov ◽  
...  
2009 ◽  
Vol 00 (00) ◽  
pp. 090915102728058-8
Author(s):  
Yoshiteru Kato ◽  
Yasuhiko Nakashima ◽  
Naoki Shino ◽  
Koichi Sasaki ◽  
Akihiro Hosokawa ◽  
...  

2001 ◽  
Vol 89 (12) ◽  
pp. 8273-8278 ◽  
Author(s):  
Yuri Kaganovskii ◽  
Irena Antonov ◽  
Fredrick Bass ◽  
Michael Rosenbluh ◽  
Audrey Lipovskii

2012 ◽  
Vol 112 (6) ◽  
pp. 063520 ◽  
Author(s):  
E. Zielony ◽  
E. Płaczek-Popko ◽  
A. Henrykowski ◽  
Z. Gumienny ◽  
P. Kamyczek ◽  
...  

2001 ◽  
Vol 40 (Part 2, No. 10A) ◽  
pp. L1054-L1057 ◽  
Author(s):  
Yo Ichikawa ◽  
Kentaro Setsune ◽  
Syun-ichiro Kawashima ◽  
Koichi Kugimiya

1996 ◽  
Vol 53 (2) ◽  
pp. 543-546 ◽  
Author(s):  
P. Tosin ◽  
W. Lüthy ◽  
H. P. Weber

2021 ◽  
Vol 13 (4) ◽  
pp. 624-631
Author(s):  
Jianyao Lin ◽  
Yu Chen ◽  
Yun Ye ◽  
Sheng Xu ◽  
Tailiang Guo ◽  
...  

We present a ligand-exchange-free photo-patternable quantum-dot photoresist (QDPR) with high photolithographic uniformity. The dispersion mechanism between the QD’s surface ligands and the functional groups of photoresist polymers are studied. Results show that the dispersibility and photoluminescent intensity of this QDPR can be both improved by controlling dispersant and antioxidant. For device demonstration, multi-colored quantum dot color conversion films (QDCCF) were prepared and patterned by a photolithography process. High QD dispersibility and film-forming uniformity were both achieved with this QDCCF. It is believed that the proposed QDPR has the potential to be extensively used in lighting or display applications.


1991 ◽  
Vol 16 (12) ◽  
pp. 940 ◽  
Author(s):  
Norbert Leclerc ◽  
Stephan Thomas ◽  
Heinz Fabian ◽  
Christoph Pfleiderer ◽  
Hermine Hitzler ◽  
...  

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