Effect of reducing the contaminant concentration when patterning a chemically amplified positive resist

1995 ◽  
Author(s):  
Akira Oikawa ◽  
Yasunori Hatakenaka ◽  
Yumiko Ikeda ◽  
Yoko Kokubo ◽  
Motoko Tanishima ◽  
...  
Keyword(s):  
Contaminant Concentration ◽  
Chemically Amplified ◽  
Positive Resist

Performance of a chemically amplified positive resist for next-generation photomask fabrication

1998 ◽  
Author(s):  
Masa-aki Kurihara ◽  
Toshikazu Segawa ◽  
Daichi Okuno ◽  
Naoya Hayashi ◽  
Hisatake Sano
Keyword(s):  
Next Generation ◽  
Chemically Amplified ◽  
Positive Resist

Optimization of dissolution-rate characteristics of chemically amplified positive resist

1995 ◽  
Author(s):  
Toshiro Itani ◽  
Haruo Iwasaki ◽  
Hiroshi Yoshino ◽  
Masashi Fujimoto ◽  
Kunihiko Kasama
Keyword(s):  
Dissolution Rate ◽  
Chemically Amplified ◽  
Positive Resist

Quarter- and subquarter-micron deep-UV lithography with chemically amplified positive resist

1996 ◽  
Author(s):  
Yasunobu Onishi ◽  
Kazuo Sato ◽  
Kenzi Chiba ◽  
Masafumi Asano ◽  
Hirokazu Niki ◽  
...  
Keyword(s):  
Uv Lithography ◽  
Chemically Amplified ◽  
Deep Uv ◽  
Positive Resist

Electron-beam lithography of isolated trenches with chemically amplified positive resist

2002 ◽  
Author(s):  
Andrew R. Eckert ◽  
Richard J. Bojko ◽  
Harold Gentile ◽  
Robert Harris ◽  
Jay Jayashankar ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Chemically Amplified ◽  
Positive Resist

Chemically amplified, thick film, i-line positive resist for electroplating and redistribution applications

2006 ◽  
Author(s):  
Medhat Toukhy ◽  
Salem Mullen ◽  
Margareta Paunescu ◽  
Chunwei Chen ◽  
Stephen Meyer ◽  
...  
Keyword(s):  
Thick Film ◽  
Chemically Amplified ◽  
Positive Resist

Chemically amplified i-line positive resist for next-generation flat panel display

2017 ◽  
Author(s):  
Hsing-Chieh Lee ◽  
Ying-Hao Lu ◽  
Shin-Yih Huang ◽  
Wei-Jen Lan ◽  
Makoto Hanabata
Keyword(s):  
Flat Panel Display ◽  
Next Generation ◽  
Flat Panel ◽  
Chemically Amplified ◽  
Positive Resist

Relationship between Dissolution Inhibitors and Dissolution Rate of Resist in Chemically Amplified Three-Component Positive Resist

1995 ◽  
Vol 34 (Part 1, No. 8A) ◽  
pp. 4247-4252 ◽  
Author(s):  
Hideo Horibe ◽  
Teruhiko Kumada ◽  
Shigeru Kubota ◽  
Yoshika Kimura
Keyword(s):  
Dissolution Rate ◽  
Chemically Amplified ◽  
Positive Resist
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