Study for the design of high-resolution novolak-DNQ photoresist: the effects of low-molecular-weight phenolic compounds on resist systems
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2014 ◽
Vol 48
(3)
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pp. 355-362
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2010 ◽
Vol 232
(1)
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pp. 113-121
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2005 ◽
Vol 220
(5-6)
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pp. 597-606
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