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Full chip two-layer CD and overlay process window analysis
Mapping Intimacies
◽
10.1117/12.2086368
◽
2015
◽
Cited By ~ 1
Author(s):
Rachit Gupta
◽
Shumay Shang
◽
John Sturtevant
Keyword(s):
Process Window
◽
Window Analysis
Download Full-text
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Integrating CD and Lithographic Process Window analysis with Mask Data Preparation for Subwavelength ICs
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Hot-Spot Detection and Correction Using Full-Chip-Based Process Window Analysis
Japanese Journal of Applied Physics
◽
10.1143/jjap.47.4893
◽
2008
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Vol 47
(6)
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pp. 4893-4897
Author(s):
Sang-Wook Kim
◽
Sung-Soo Suh
◽
Yong-Jin Chun
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Young-Chang Kim
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◽
...
Keyword(s):
Hot Spot
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Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm
10.1117/12.687008
◽
2006
◽
Author(s):
Mark Mason
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Shane Best
◽
Gary Zhang
◽
Mark Terry
◽
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Keyword(s):
Process Window
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Load controlled process window analysis of feed controlled CNC grinding
Optical Fabrication, Testing, and Metrology VI
◽
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◽
Christian Vogt
◽
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Keyword(s):
Process Window
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Process window analysis of ductile mode machining of binderless tungsten carbide molds
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10.1117/12.2323242
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Process Window
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Hot-spot detection and correction using full-chip based process window analysis
2007 Digest of papers Microprocesses and Nanotechnology
◽
10.1109/imnc.2007.4456102
◽
2007
◽
Author(s):
Sang-Wook Kim
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Sung-Soo Suh
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Young-Chang Kim
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Jung-Hyeon Lee
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Keyword(s):
Hot Spot
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Process Window
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Process window analysis of algorithmic assist feature placement options at the 2X nm node DRAM
10.1117/12.2011450
◽
2013
◽
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◽
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Process Window
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Robust approach to determine the optimized illumination condition using process window analysis
10.1117/12.729026
◽
2007
◽
Cited By ~ 1
Author(s):
Yong-Jin Chun
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Sung-Woo Lee
◽
Sooryong Lee
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Keyword(s):
Process Window
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Illumination Condition
◽
Robust Approach
◽
Window Analysis
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