Process window analysis of the ARC and TAR systems for quarter-micron optical lithography

1994 ◽  
Author(s):  
Hiroshi Yoshino ◽  
Takeshi Ohfuji ◽  
Naoaki Aizaki
Keyword(s):  
Optical Lithography ◽  
Process Window ◽  
Window Analysis

Investigation of pupil-fill factors as process window indicators for dry optical lithography

2008 ◽  
Vol 40 (1) ◽  
pp. 142-155 ◽  
Author(s):  
Jeun Kee Chua ◽  
Vadakke Matham Murukeshan ◽  
Sia Kim Tan ◽  
Qun Ying Lin
Keyword(s):  
Optical Lithography ◽  
Process Window

Maximising the process window in sub-half-micron optical lithography

2000 ◽  
Vol 53 (1-4) ◽  
pp. 145-148 ◽  
Author(s):  
G. Arthur ◽  
B. Martin ◽  
C. Wallace
Keyword(s):  
Optical Lithography ◽  
Process Window

Hot-Spot Detection and Correction Using Full-Chip-Based Process Window Analysis

2008 ◽  
Vol 47 (6) ◽  
pp. 4893-4897
Author(s):  
Sang-Wook Kim ◽  
Sung-Soo Suh ◽  
Yong-Jin Chun ◽  
Young-Chang Kim ◽  
Suk-Joo Lee ◽  
...  
Keyword(s):  
Hot Spot ◽  
Process Window ◽  
Window Analysis ◽  
Spot Detection

Process window analysis of ductile mode machining of binderless tungsten carbide molds

2018 ◽  
Author(s):  
Marius Doetz ◽  
Ji Eun Lee ◽  
Olaf Dambon ◽  
Fritz Klocke ◽  
Eckhard Langenbach ◽  
...  
Keyword(s):  
Tungsten Carbide ◽  
Process Window ◽  
Window Analysis ◽  
Ductile Mode

Hot-spot detection and correction using full-chip based process window analysis

2007 ◽  
Author(s):  
Sang-Wook Kim ◽  
Sung-Soo Suh ◽  
Young-Chang Kim ◽  
Suk-Joo Lee ◽  
Jung-Hyeon Lee ◽  
...  
Keyword(s):  
Hot Spot ◽  
Process Window ◽  
Window Analysis ◽  
Spot Detection

Full chip two-layer CD and overlay process window analysis

2015 ◽  
Author(s):  
Rachit Gupta ◽  
Shumay Shang ◽  
John Sturtevant
Keyword(s):  
Process Window ◽  
Window Analysis
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