Optimization of design-wavelength for unobtrusive chromatic aberration in high-definition color computer holography

2015 ◽  
Author(s):  
Takashi Miyaoka ◽  
Kyoji Matsushima ◽  
Sumio Nakahara
Keyword(s):  
Chromatic Aberration ◽  
High Definition ◽  
Computer Holography ◽  
Color Computer

scholarly journals Computer holography: 3D digital art based on high-definition CGH

2013 ◽  
Vol 415 ◽  
pp. 012053 ◽  
Author(s):  
K Matsushima ◽  
S Nakahara ◽  
Y Arima ◽  
H Nishi ◽  
H Yamashita ◽  
...  
Keyword(s):  
Digital Art ◽  
High Definition ◽  
Computer Holography

Color Computer Holography Generated by Depth and Wavelength Compensating Algorithm

2016 ◽  
Vol 43 (6) ◽  
pp. 0609007
Author(s):  
赵锴 Zhao Kai ◽  
黄应清 Huang Yingqing ◽  
蒋晓瑜 Jiang Xiaoyu ◽  
闫兴鹏 Yan Xingpeng
Keyword(s):  
Computer Holography ◽  
Color Computer

Design of objective lens for 200-kV high-resolution electron microscopes

1983 ◽  
Vol 41 ◽  
pp. 314-315
Author(s):  
K. Tsuno ◽  
T. Honda ◽  
Y. Harada ◽  
M. Naruse
Keyword(s):  
Optical Properties ◽  
Computer Technology ◽  
Axial Magnetic Field ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Resolution Electron ◽  
Correction Of Astigmatism ◽  
Three Stages ◽  
Electron Microscopes ◽  
Stage 1

Developement of computer technology provides much improvements on electron microscopy, such as simulation of images, reconstruction of images and automatic controll of microscopes (auto-focussing and auto-correction of astigmatism) and design of electron microscope lenses by using a finite element method (FEM). In this investigation, procedures for simulating the optical properties of objective lenses of HREM and the characteristics of the new lens for HREM at 200 kV are described.The process for designing the objective lens is divided into three stages. Stage 1 is the process for estimating the optical properties of the lens. Firstly, calculation by FEM is made for simulating the axial magnetic field distributions Bzc of the lens. Secondly, electron ray trajectory is numerically calculated by using Bzc. And lastly, using Bzc and ray trajectory, spherical and chromatic aberration coefficients Cs and Cc are numerically calculated. Above calculations are repeated by changing the shape of lens until! to find an optimum aberration coefficients.

Resolution, Contrast and Interpretation of HVEM Images of Crystals

1973 ◽  
Vol 31 ◽  
pp. 228-229
Author(s):  
L. E. Thomas ◽  
J. S. Lally ◽  
R. M. Fisher
Keyword(s):  
High Voltage ◽  
Chromatic Aberration ◽  
Crystalline Materials ◽  
Resolution Parameter ◽  
Instrument Resolution ◽  
Imaging Conditions ◽  
Beam Excitation ◽  
Optimum Imaging

In addition to improved penetration at high voltage, the characteristics of HVEM images of crystalline materials are changed markedly as a result of many-beam excitation effects. This leads to changes in optimum imaging conditions for dislocations, planar faults, precipitates and other features.Resolution - Because of longer focal lengths and correspondingly larger aberrations, the usual instrument resolution parameter, CS174 λ 374 changes by only a factor of 2 from 100 kV to 1 MV. Since 90% of this change occurs below 500 kV any improvement in “classical” resolution in the MVEM is insignificant. However, as is widely recognized, an improvement in resolution for “thick” specimens (i.e. more than 1000 Å) due to reduced chromatic aberration is very large.

The Resolution and Contrast in Biological Sections Determined by Inelastic and Elastic Scattering

1973 ◽  
Vol 31 ◽  
pp. 224-225
Author(s):  
D. L. Misell
Keyword(s):  
Electron Microscopy ◽  
Adverse Effect ◽  
Elastic Scattering ◽  
Inelastic Scattering ◽  
Amorphous Carbon ◽  
Polymeric Materials ◽  
Chromatic Aberration ◽  
Image Resolution ◽  
Quantitative Estimates ◽  
Elastic Ratio

In the electron microscopy of biological sections the adverse effect of chromatic aberration on image resolution is well known. In this paper calculations are presented for the inelastic and elastic image intensities using a wave-optical formulation. Quantitative estimates of the deterioration in image resolution as a result of chromatic aberration are presented as an alternative to geometric calculations. The predominance of inelastic scattering in the unstained biological and polymeric materials is shown by the inelastic to elastic ratio, I/E, within an objective aperture of 0.005 rad for amorphous carbon of a thickness, t=50nm, typical of biological sections; E=200keV, I/E=16.

Observability of Very Thick Specimen by Using Transmission Scanning Electron Microscope

1971 ◽  
Vol 29 ◽  
pp. 26-27
Author(s):  
K. Shibatomi ◽  
T. Yamanoto ◽  
H. Koike
Keyword(s):  
Electron Microscope ◽  
Image Quality ◽  
Scanning Electron Microscope ◽  
Chromatic Aberration ◽  
Image Contrast ◽  
Objective Lens ◽  
Thick Specimen ◽  
Transmission Electron ◽  
Scanning Electron

In the observation of a thick specimen by means of a transmission electron microscope, the intensity of electrons passing through the objective lens aperture is greatly reduced. So that the image is almost invisible. In addition to this fact, it have been reported that a chromatic aberration causes the deterioration of the image contrast rather than that of the resolution. The scanning electron microscope is, however, capable of electrically amplifying the signal of the decreasing intensity, and also free from a chromatic aberration so that the deterioration of the image contrast due to the aberration can be prevented. The electrical improvement of the image quality can be carried out by using the fascionating features of the SEM, that is, the amplification of a weak in-put signal forming the image and the descriminating action of the heigh level signal of the background. This paper reports some of the experimental results about the thickness dependence of the observability and quality of the image in the case of the transmission SEM.

Electronic Cone Illumination with the Conventional Transmission Electron Microscope

1977 ◽  
Vol 35 ◽  
pp. 72-73
Author(s):  
William Krakow
Keyword(s):  
Electronic Device ◽  
Chromatic Aberration ◽  
Objective Lens ◽  
Hollow Cone ◽  
Transmission Electron ◽  
Lissajous Figures ◽  
High Resolution Images ◽  
Imaging Mode ◽  
Diffraction Patterns ◽  
Transmission Microscope

An electronic device has been constructed which manipulates the primary beam in the conventional transmission microscope to illuminate a specimen under a variety of virtual condenser aperture conditions. The device uses the existing tilt coils of the microscope, and modulates the D.C. signals to both x and y tilt directions simultaneously with various waveforms to produce Lissajous figures in the back-focal plane of the objective lens. Electron diffraction patterns can be recorded which reflect the manner in which the direct beam is tilted during exposure of a micrograph. The device has been utilized mainly for the hollow cone imaging mode where the device provides a microscope transfer function without zeros in all spatial directions and has produced high resolution images which are also free from the effect of chromatic aberration. A standard second condenser aperture is employed and the width of the cone annulus is readily controlled by defocusing the second condenser lens.

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