Impact of B4C capping layer for EUV mask on the sensitivity of patterned mask inspection using projection electron microscope

2014 ◽  
Author(s):  
Susumu Iida ◽  
Ryoichi Hirano ◽  
Tsuyoshi Amano ◽  
Hidehiro Watanabe
Keyword(s):  
Electron Microscope ◽  
Capping Layer ◽  
Mask Inspection

Extreme ultraviolet patterned mask inspection performance of advanced projection electron microscope system for 11nm half-pitch generation

2016 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Hidehiro Watanabe ◽  
Masahiro Hatakeyama ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Inspection Performance

Recent results from EUVL patterned mask inspection using projection electron microscope system

2014 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Tsuneo Terasawa ◽  
Hidehiro Watanabe ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Mask Inspection

EUV patterned mask inspection system using a projection electron microscope technique

2013 ◽  
Author(s):  
Hidehiro Watanabe ◽  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Tsuneo Terasawa ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Inspection System ◽  
Microscope Technique ◽  
Mask Inspection

Patterned mask inspection technology with projection electron microscope technique on extreme ultraviolet masks

2014 ◽  
Vol 13 (1) ◽  
pp. 013009 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Tsuneo Terasawa ◽  
Hidehiro Watanabe ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Extreme Ultraviolet ◽  
Microscope Technique ◽  
Mask Inspection

EUV patterned mask inspection with an advanced projection electron microscope (PEM) system

2014 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Tsuneo Terasawa ◽  
Hidehiro Watanabe ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Mask Inspection

EUV patterned mask inspection performance of an advanced projection electron microscope (PEM) system for hp 16 nm and beyond

2014 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Tsueno Terasawa ◽  
Hidehiro Watanabe ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Mask Inspection ◽  
Inspection Performance

Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks

2015 ◽  
Author(s):  
Ryoichi Hirano ◽  
Susumu Iida ◽  
Tsuyoshi Amano ◽  
Hidehiro Watanabe ◽  
Masahiro Hatakeyama ◽  
...  
Keyword(s):  
Electron Microscope ◽  
Mask Inspection
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