Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers
2017 ◽
Vol 16
(04)
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pp. 1
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2005 ◽
Vol 42
(3)
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pp. 180-183
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Keyword(s):
Keyword(s):
2009 ◽
Vol 30
(12)
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pp. 1002-1008
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Keyword(s):