High quality large area ELOG InP on silicon for photonic integration using conventional optical lithography

2014 ◽  
Author(s):  
Himanshu Kataria ◽  
Wondwosen T. Metaferia ◽  
Carl Junesand ◽  
Chong Zhang ◽  
John E. Bowers ◽  
...  
Keyword(s):  
Optical Lithography ◽  
Photonic Integration ◽  
Large Area ◽  
High Quality

Large-area synthesis of high-quality β-MnO2nanowires and the mechanism of formation through a facile mineralization process

2005 ◽  
Vol 16 (10) ◽  
pp. 2072-2076 ◽  
Author(s):  
Fu Zhou ◽  
Huagui Zheng ◽  
Xuemei Zhao ◽  
Qixun Guo ◽  
Xiaomin Ni ◽  
...  
Keyword(s):  
Mechanism Of Formation ◽  
Large Area ◽  
Mineralization Process ◽  
High Quality

On‐axis dc magnetron sputtering of large area high quality YBa2Cu3O7superconducting thin films

1992 ◽  
Vol 61 (3) ◽  
pp. 348-350 ◽  
Author(s):  
Y. Z. Zhang ◽  
L. Li ◽  
Y. Y. Zhao ◽  
B. R. Zhao ◽  
J. W. Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Large Area ◽  
High Quality

CVD growth of high-quality and large-area continuous h-BN thin films directly on stainless-steel as protective coatings

2021 ◽  
pp. 100135
Author(s):  
Shuai Jia ◽  
Weibing Chen ◽  
Jing Zhang ◽  
Chen-Yang Lin ◽  
Hua Guo ◽  
...  
Keyword(s):  
Thin Films ◽  
Stainless Steel ◽  
Protective Coatings ◽  
Large Area ◽  
High Quality ◽  
Cvd Growth

Deposition of large area high quality diamond wafers with high growth rate by DC arc plasma jet

2000 ◽  
Vol 9 (9-10) ◽  
pp. 1673-1677 ◽  
Author(s):  
H. Guo ◽  
Z.L. Sun ◽  
Q.Y. He ◽  
S.M. Du ◽  
X.B. Wu ◽  
...  
Keyword(s):  
Growth Rate ◽  
High Growth ◽  
Plasma Jet ◽  
High Growth Rate ◽  
Arc Plasma ◽  
Large Area ◽  
High Quality ◽  
Dc Arc

scholarly journals Understanding the Synthetic Pathway to Large-Area, High-Quality [AgSePh]∞ Nanocrystal Films

2020 ◽  
Vol 124 (41) ◽  
pp. 22845-22852 ◽  
Author(s):  
Lorenzo Maserati ◽  
Stefano Pecorario ◽  
Mirko Prato ◽  
Mario Caironi
Keyword(s):  
Large Area ◽  
High Quality ◽  
Synthetic Pathway ◽  
Nanocrystal Films

scholarly journals Two-Dimensional Materials in Large-Areas: Synthesis, Properties and Applications

2020 ◽  
Vol 12 (1) ◽  
Author(s):  
Ali Zavabeti ◽  
Azmira Jannat ◽  
Li Zhong ◽  
Azhar Ali Haidry ◽  
Zhengjun Yao ◽  
...  
Keyword(s):  
Two Dimensional ◽  
Large Area ◽  
Large Crystal ◽  
High Quality ◽  
Future Technology ◽  
Advantages And Disadvantages ◽  
Grain Sizes ◽  
Two Dimensional Materials ◽  
Synthesis Properties ◽  
Synthetic Routes

AbstractLarge-area and high-quality two-dimensional crystals are the basis for the development of the next-generation electronic and optical devices. The synthesis of two-dimensional materials in wafer scales is the first critical step for future technology uptake by the industries; however, currently presented as a significant challenge. Substantial efforts have been devoted to producing atomically thin two-dimensional materials with large lateral dimensions, controllable and uniform thicknesses, large crystal domains and minimum defects. In this review, recent advances in synthetic routes to obtain high-quality two-dimensional crystals with lateral sizes exceeding a hundred micrometres are outlined. Applications of the achieved large-area two-dimensional crystals in electronics and optoelectronics are summarised, and advantages and disadvantages of each approach considering ease of the synthesis, defects, grain sizes and uniformity are discussed.

Controlled growth of large-area and high-quality molybdenum disulfide

2017 ◽  
Vol 56 (11) ◽  
pp. 110302
Author(s):  
Ja-Yeon Kim ◽  
Doo-Hyung Kim ◽  
Min-Ki Kwon
Keyword(s):  
Molybdenum Disulfide ◽  
Controlled Growth ◽  
Large Area ◽  
High Quality

Realization of Three-Dimensional Nanostructure Fabrication by Nanoimprint on Silicon Substrate

2011 ◽  
Vol 211-212 ◽  
pp. 1105-1109
Author(s):  
Xi Qiu Fan
Keyword(s):  
Silicon Substrate ◽  
Low Cost ◽  
Three Dimensional ◽  
Microlens Array ◽  
Optical Lithography ◽  
High Fidelity ◽  
Fabrication Method ◽  
Nanostructure Fabrication ◽  
Large Area ◽  
3D Nanostructures

Traditional optical lithography techniques to fabricate three-dimensional (3D) nanostructures are complicated and time consuming. Due to the capability to replicate nanostructures repeatedly in a large area with high resolution and uniformity, nanoimprint (NI) has been recognized as one of the promising approaches to fabricate 3-D nanostructures with high throughput and low cost. This paper introduces a novel 3-D nanostructure fabrication method by nanoimprint on silicon substrate. Nanoscale gratings and microlens array are taken as examples of 3-D nanostructures fabricated by nanoimprint. High fidelity demonstrates the possibility of nanoimprint to fabricate 3-D nanostructures on silicon substrate.

Sign in / Sign up

Export Citation Format

Share Document