Examination of multi-shot laser induced damage on uncoated fused silica substrates at the surface and in the bulk material using P-polarized 1 ns 1.5 kHz laser pulses at 1064 nm

2013 ◽  
Author(s):  
Furqan L. Chiragh ◽  
Oleg A. Konoplev ◽  
Alexey A. Vasilyev ◽  
Demetrios Poulios ◽  
Mark A. Stephen ◽  
...  
Keyword(s):  
Bulk Material ◽  
Laser Pulses ◽  
Fused Silica ◽  
Laser Induced Damage ◽  
Silica Substrates

scholarly journals Laser-Induced Point Defects in Fused Silica Irradiated by UV Laser in Vacuum

2014 ◽  
Vol 2014 ◽  
pp. 1-7 ◽  
Author(s):  
Xiaoyan Zhou ◽  
Xinda Zhou ◽  
Jin Huang ◽  
Qiang Cheng ◽  
Fengrui Wang ◽  
...  
Keyword(s):  
Point Defects ◽  
Fluorescence Spectra ◽  
Uv Spectroscopy ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Fused Silica ◽  
Third Harmonic ◽  
Structural Modifications ◽  
Laser Induced Damage ◽  
Induced Defects

High-purity fused silica irradiated by third harmonic of the Nd:YAG laser in vacuum with different laser pulse parameters was studied experimentally. Laser-induced defects are investigated by UV spectroscopy, and fluorescence spectra and correlated to the structural modifications in the glass matrix through Raman spectroscopy. Results show that, for laser fluence below laser-induced damage threshold (LIDT), the absorbance and intensity of fluorescence bands increase with laser energies and/or number of laser pulses, which indicates that laser-induced defects are enhanced by laser energies and/or number of laser pulses in vacuum. The optical properties of these point defects were discussed in detail.

scholarly journals SSD detection on LIDT tested coated Fused Silica samples

2021 ◽  
Vol 255 ◽  
pp. 03009
Author(s):  
Heidi Cattaneo ◽  
Daniel Schachtler ◽  
Roelene Botha ◽  
Oliver Fähnle
Keyword(s):  
Laser Energy ◽  
Substrate Surface ◽  
Single Layer ◽  
Damage Threshold ◽  
Surface Damage ◽  
Laser Pulses ◽  
Fused Silica ◽  
Small Surface ◽  
Additional Information ◽  
Laser Induced Damage

Material changes and Sub-Surface Damage (SSD) under Laser Induced Damage Threshold (LIDT) testing sites were investigated on 3 diverse single layer coated transparent fused silica samples to obtain additional information on damage precursors on these samples. As a detection method, photothermal deflection technique utilizing a resonant UV laser beam was used. The local variations in UV absorption and probe beam transmittance due to previous exposure to high fluence laser pulses were strongly dependent on the coating itself and on the laser energy used during the LIDT testing. Also the obtained LIDT values differ from coating to coating. Detected effects on the coatings and substrate surface beneath ranged from small surface dislocations to complete coating damage with material transformations. Additional absorbing damage precursors were found close to the damaged sites.

Material Processing Using Femtosecond Lasers: Repairing Patterned Photomasks

MRS Bulletin ◽  
2006 ◽  
Vol 31 (8) ◽  
pp. 634-638 ◽  
Author(s):  
Richard Haight ◽  
Peter Longo ◽  
Alfred Wagner
Keyword(s):  
Semiconductor Industry ◽  
Femtosecond Laser Ablation ◽  
Laser Pulses ◽  
Repair Process ◽  
Spot Size ◽  
Fused Silica ◽  
Ultrafast Laser Pulses ◽  
Light Pulses ◽  
Nanosecond Pulses ◽  
Silica Substrates

AbstractThe use of ultrafast laser pulses is having an impact on materials processing in profound ways. “Machining” with femtosecond pulses affords considerable advantages over nanosecond pulses, such as subdiffraction-limited material ablation, where ablated spot dimensions are below that achievable when longer pulses are focused to the minimum spot size dictated by optical physics. These properties have been exploited to address what had become a critical problem in the semiconductor industry, the repair of patterned photomasks. We will describe how the fundamentals of femtosecond laser ablation have been implemented in a machine designed to repair photomasks. We will also describe experiments designed to deposit Cr metal onto fused-silica substrates using 100-fs, 400-nm light pulses at atmospheric pressure. Multiphoton dissociation of Cr(CO)6 adsorbed on fused-silica substrates initiates Cr deposition. The mechanisms for deposition on both transparent (fused silica) and absorbing (Cr metal) substrates are discussed. Finally, we describe experiments that were carried out to extend the photomask repair process to shorter wavelengths (below 200 nm) using light generated by frequency-mixing of ultrashort, 30-fs pulses in an Ar-filled capillary.

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Laser-induced damage thresholds of ultrathin targets and their constraint on laser contrast in laser-driven ion acceleration experiments

2020 ◽  
Vol 8 ◽  
Author(s):  
Dahui Wang ◽  
Yinren Shou ◽  
Pengjie Wang ◽  
Jianbo Liu ◽  
Zhusong Mei ◽  
...  
Keyword(s):  
Damage Threshold ◽  
Wide Band ◽  
Laser Pulses ◽  
Laser Damage Threshold ◽  
Single Shot ◽  
Bulk Materials ◽  
Free Standing ◽  
Wide Band Gap ◽  
Different Types ◽  
Laser Induced Damage

Abstract Single-shot laser-induced damage threshold (LIDT) measurements of multi-type free-standing ultrathin foils were performed in a vacuum environment for 800 nm laser pulses with durations τ ranging from 50 fs to 200 ps. The results show that the laser damage threshold fluences (DTFs) of the ultrathin foils are significantly lower than those of corresponding bulk materials. Wide band gap dielectric targets such as SiN and formvar have larger DTFs than semiconductive and conductive targets by 1–3 orders of magnitude depending on the pulse duration. The damage mechanisms for different types of targets are studied. Based on the measurement, the constrain of the LIDTs on the laser contrast is discussed.

scholarly journals Influence of Substrate Materials on Nucleation and Properties of Iridium Thin Films Grown by ALD

Coatings ◽  
2021 ◽  
Vol 11 (2) ◽  
pp. 173
Author(s):  
Paul Schmitt ◽  
Vivek Beladiya ◽  
Nadja Felde ◽  
Pallabi Paul ◽  
Felix Otto ◽  
...  
Keyword(s):  
Thin Films ◽  
Film Growth ◽  
Bulk Material ◽  
Atomic Layer ◽  
Substrate Material ◽  
Fused Silica ◽  
Silicon Wafers ◽  
Force Microscopy ◽  
Angle Measurements ◽  
Influence Of Substrate

Ultra-thin metallic films are widely applied in optics and microelectronics. However, their properties differ significantly from the bulk material and depend on the substrate material. The nucleation, film growth, and layer properties of atomic layer deposited (ALD) iridium thin films are evaluated on silicon wafers, BK7, fused silica, SiO2, TiO2, Ta2O5, Al2O3, HfO2, Ru, Cr, Mo, and graphite to understand the influence of various substrate materials. This comprehensive study was carried out using scanning electron and atomic force microscopy, X-ray reflectivity and diffraction, four-point probe resistivity and contact angle measurements, tape tests, and Auger electron spectroscopy. Within few ALD cycles, iridium islands occur on all substrates. Nevertheless, their size, shape, and distribution depend on the substrate. Ultra-thin (almost) closed Ir layers grow on a Ta2O5 seed layer after 100 cycles corresponding to about 5 nm film thickness. In contrast, the growth on Al2O3 and HfO2 is strongly inhibited. The iridium growth on silicon wafers is overall linear. On BK7, fused silica, SiO2, TiO2, Ta2O5, Ru, Cr, and graphite, three different growth regimes are distinguishable. The surface free energy of the substrates correlates with their iridium nucleation delay. Our work, therefore, demonstrates that substrates can significantly tailor the properties of ultra-thin films.

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