Mix & match electron beam & scanning probe lithography for high throughput sub-10 nm lithography

2013 ◽  
Author(s):  
Marcus Kaestner ◽  
Manuel Hofer ◽  
Ivo W. Rangelow
Keyword(s):  
Electron Beam ◽  
High Throughput ◽  
Scanning Probe ◽  
Beam Scanning ◽  
Scanning Probe Lithography

High-throughput protein nanopatterning

2019 ◽  
Vol 219 ◽  
pp. 33-43 ◽  
Author(s):  
Xiangyu Liu ◽  
Mohit Kumar ◽  
Annalisa Calo’ ◽  
Edoardo Albisetti ◽  
Xiaouri Zheng ◽  
...  
Keyword(s):  
High Resolution ◽  
High Throughput ◽  
Scanning Probe ◽  
Scanning Probe Lithography

We demonstrate a high resolution and high-throughput patterning method to generate protein nanopatterns with sub-10 nm resolution by using thermochemical scanning probe lithography.

Scanning Probe Lithography with Negative and Positive Electron Beam Resists

2013 ◽  
Vol 52 (5R) ◽  
pp. 056501 ◽  
Author(s):  
Lydia Anggraini ◽  
Bungo Tanaka ◽  
Naoki Matsuzuka ◽  
Yoshitada Isono
Keyword(s):  
Electron Beam ◽  
Scanning Probe ◽  
Scanning Probe Lithography

scholarly journals Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO2 nanorods

2019 ◽  
Vol 10 ◽  
pp. 412-418
Author(s):  
Julian Kalb ◽  
Vanessa Knittel ◽  
Lukas Schmidt-Mende
Keyword(s):  
Atomic Force Microscopy ◽  
Electron Beam ◽  
Electron Beam Lithography ◽  
Tio2 Nanorods ◽  
Scanning Probe ◽  
Controlled Growth ◽  
Scanning Probe Lithography ◽  
Force Microscopy ◽  
Atomic Force ◽  
Tip Radius

In this article, we demonstrate the position-controlled hydrothermal growth of rutile TiO2 nanorods using a new scanning probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO2 film. This process scratches the film causing tiny anatase TiO2 nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile nanocrystals and provide the growth of rutile TiO2 nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO2 nanostructures.

Investigations on the positioning accuracy of the Nano Fabrication Machine (NFM-100)

2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Jaqueline Stauffenberg ◽  
Ingo Ortlepp ◽  
Ulrike Blumröder ◽  
Denis Dontsov ◽  
Christoph Schäffel ◽  
...  
Keyword(s):  
Target Position ◽  
Repeated Measurements ◽  
Scanning Probe ◽  
Measuring System ◽  
Direct Drive ◽  
Positioning Accuracy ◽  
Scanning Probe Lithography ◽  
Nano Fabrication ◽  
Atomic Force ◽  
Acceleration And Deceleration

Abstract This contribution deals with the analysis of the positioning accuracy of a new Nano Fabrication Machine. This machine uses a planar direct drive system and has a positioning range up to 100 mm in diameter. The positioning accuracy was investigated in different movement scenarios, including phases of acceleration and deceleration. Also, the target position error of certain movements at different positions of the machine slider is considered. Currently, the NFM-100 is equipped with a tip-based measuring system. This Atomic Force Microscope (AFM) uses self-actuating and self-sensing microcantilevers, which can be used also for Field-Emission-Scanning-Probe-Lithography (FESPL). This process is capable of fabricating structures in the range of nanometres. In combination with the NFM-100 and its positioning range, nanostructures can be analysed and written in a macroscopic range without any tool change. However, the focus in this article is on the measurement and positioning accuracy of the tip-based measuring system in combination with the NFM-100 and is verified by repeated measurements. Finally, a linescan, realised using both systems, is shown over a long range of motion of 30 mm.

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