An investigation of high-order process correction models and techniques to improve overlay control by using multiple-pass cascading analysis at an advanced technology node

2013 ◽  
Author(s):  
Md Zakir Ullah ◽  
Mohamed Fazly Mohamed Jazim ◽  
Stephen Tran ◽  
Andy Qiu ◽  
Dawn Goh ◽  
...  
Keyword(s):  
High Order ◽  
Advanced Technology ◽  
Order Process ◽  
High Order Process ◽  
Technology Node ◽  
Multiple Pass

Closed-Loop Identification Using Laguerre Series Expansions for Second-Order Plus Time Delay Model

2013 ◽  
Vol 416-417 ◽  
pp. 822-833
Author(s):  
Qi Bing Jin ◽  
Si Nian Li ◽  
Qie Liu ◽  
Qi Wang
Keyword(s):  
Time Delay ◽  
Closed Loop ◽  
Second Order ◽  
High Order ◽  
Series Expansions ◽  
Delay Model ◽  
Order Process ◽  
High Order Process ◽  
Laguerre Series ◽  
Closed Loop Identification

In this paper, a simple yet robust closed-loop identification method based on step response is presented. By approximating the process response firstly using Laguerre series expansions, a high-order process transfer function can be obtained. Then, a linear two-step reduction technique is used to reduce the high-order process to a second-order plus time delay model based on the frequency response data. This method is robust to measurement noise and it also does not need any numerical technique or iterative optimization. Simulation examples show the effectiveness of the proposed method for different process models. Comparison of identification performance between different methods is also illustrated in this work.

Root Cause Analysis for Pin Leakage

2016 ◽  
Author(s):  
Zhigang Song ◽  
Jochonia Nxumalo ◽  
Manuel Villalobos ◽  
Sweta Pendyala
Keyword(s):  
Failure Analysis ◽  
Root Cause Analysis ◽  
Advanced Technology ◽  
Process Step ◽  
Cause Analysis ◽  
Hard Mask ◽  
Technology Node ◽  
Root Cause ◽  
Tools And Techniques

Abstract Pin leakage continues to be on the list of top yield detractors for microelectronics devices. It is simply manifested as elevated current with one pin or several pins during pin continuity test. Although many techniques are capable to globally localize the fault of pin leakage, root cause analysis and identification for it are still very challenging with today’s advanced failure analysis tools and techniques. It is because pin leakage can be caused by any type of defect, at any layer in the device and at any process step. This paper presents a case study to demonstrate how to combine multiple techniques to accurately identify the root cause of a pin leakage issue for a device manufactured using advanced technology node. The root cause was identified as under-etch issue during P+ implantation hard mask opening for ESD protection diode, causing P+ implantation missing, which was responsible for the nearly ohmic type pin leakage.

Characterization and Modeling of Flicker Noise in FinFETs at Advanced Technology Node

2019 ◽  
Vol 40 (6) ◽  
pp. 985-988 ◽  
Author(s):  
Pragya Kushwaha ◽  
Harshit Agarwal ◽  
Yen-Kai Lin ◽  
Avirup Dasgupta ◽  
Ming-Yen Kao ◽  
...  
Keyword(s):  
Flicker Noise ◽  
Advanced Technology ◽  
Technology Node

A Realistic Method for Time-Dependent Dielectric Breakdown Reliability Analysis for Advanced Technology Node

2016 ◽  
Vol 63 (2) ◽  
pp. 755-759 ◽  
Author(s):  
Kong Boon Yeap ◽  
Fen Chen ◽  
Huade Walter Yao ◽  
Tian Shen ◽  
Sing Fui Yap ◽  
...  
Keyword(s):  
Reliability Analysis ◽  
Dielectric Breakdown ◽  
Advanced Technology ◽  
Time Dependent ◽  
Technology Node ◽  
Time Dependent Dielectric Breakdown

Optimization Method of Controller Parameter Tuning Based Immune Principle for Complicated System

2014 ◽  
Vol 933 ◽  
pp. 348-353
Author(s):  
Xian Kun Tan ◽  
Lei Li
Keyword(s):  
Parameter Tuning ◽  
Optimization Method ◽  
Tuning Parameter ◽  
Minimum Phase ◽  
Order Process ◽  
High Order Process ◽  
Tuning Method ◽  
Complicated System ◽  
Tuning Methods ◽  
Phase Process

In order to solve the puzzle of parameter tuning of the controller in complicated system, the paper proposed a model of parameter tuning based on immune principle. Firstly it defined the antibody, antigen and affinity in tuning parameter needed, secondly explored the process of parameter tuning based on immune principle in detail, thirdly discussed the tuning method by means of optimizing parameter of the controller. And finally it took the control of high-order process as an example, and made the simulation to a highly non-minimum phase process. The simulation result shows that the proposed method is better in control quality and more effective compared with other tuning methods.

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