The effects of reduced resist consumption process conditions on total raw defects, line and space defects and single line open defects at the 20nm node
1992 ◽
Vol 50
(2)
◽
pp. 1362-1363
Keyword(s):
1986 ◽
Vol 44
◽
pp. 84-87
Keyword(s):
2019 ◽
Vol 2
(1)
◽
pp. 29-39
◽
Keyword(s):
Keyword(s):
2005 ◽
Vol 100
(3)
◽
pp. 1021
◽