Novolac design for high-resolution positive photoresist (III): a selection principle of phenolic compounds for novolac resins
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2016 ◽
Vol 64
(6)
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pp. 1367-1376
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1991 ◽
Vol 9
(2)
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pp. 254-260
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2009 ◽
Vol 633
(2)
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pp. 283-292
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