Application of charge-dissipation material in MEBES phase-shift mask fabrication

1994 ◽  
Author(s):  
Zoilo C. H. Tan ◽  
Charles A. Sauer
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask ◽  
Mask Fabrication

Preliminary study of 65 nm node alternating phase-shift mask fabrication

2002 ◽  
Author(s):  
Kouji Hosono ◽  
Naoyuki Ishiwata ◽  
Satoru Asai ◽  
Hiroshi Maruyama ◽  
Yutaka Miyahara ◽  
...  
Keyword(s):  
Phase Shift ◽  
Preliminary Study ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Practical phase control technique for alternating phase-shift mask fabrication

2000 ◽  
Author(s):  
Masahiko Takahashi ◽  
Akihiro Miyake ◽  
Hidetaka Saitou ◽  
Hiroyuki Miyashita ◽  
Shiaki M. Murai
Keyword(s):  
Phase Shift ◽  
Phase Control ◽  
Control Technique ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask ◽  
Mask Fabrication

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication

2008 ◽  
Author(s):  
Thomas Faure ◽  
Emily Gallagher ◽  
Michael Hibbs ◽  
Louis Kindt ◽  
Ken Racette ◽  
...  
Keyword(s):  
Phase Shift ◽  
Phase Shift Mask ◽  
Mask Fabrication

scholarly journals Phase-shift mask fabrication at micrometric scale by ion-exchange in glass for astronomical wavefront sensors

2020 ◽  
Vol 238 ◽  
pp. 02004
Author(s):  
Xesús Prieto-Blanco ◽  
Carlos Montero-Orille ◽  
Héctor González-Núñez ◽  
Vicente Moreno ◽  
Manuel P. Cagigal ◽  
...  
Keyword(s):  
Phase Shift ◽  
Ion Exchange ◽  
Optical Devices ◽  
Wavefront Sensors ◽  
Complete Procedure ◽  
High Control ◽  
Strategic Element ◽  
Optical Astronomy ◽  
Phase Shift Mask ◽  
Mask Fabrication

Photolithography combined with ion-exchange in glass is a well-known technology that can be applied to develop many different optical devices. In this work, we present the complete procedure to generate small circular phase-shift masks with diameters of only a few microns and high control in the phase change produced. It is a strategic element in applications such as optical astronomy.

Development of advanced process for halftone phase-shift mask fabrication with electron-beam exposure systems

1996 ◽  
Author(s):  
Minoru Komada ◽  
Masa-aki Kurihara ◽  
Shiho Sasaki ◽  
Takamitsu Makabe ◽  
Naoya Hayashi
Keyword(s):  
Electron Beam ◽  
Phase Shift ◽  
Phase Shift Mask ◽  
Mask Fabrication

Self-aligned rim-type phase-shift mask fabrication by backside exposure

1993 ◽  
Author(s):  
David S. O'Grady ◽  
Stan P. Bajuk ◽  
Edward T. Smith
Keyword(s):  
Phase Shift ◽  
Type Phase ◽  
Phase Shift Mask ◽  
Mask Fabrication
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