Hot-electron-induced light emission and impact ionization in GaAs-based devices

1993 ◽  
Author(s):  
Carlo Tedesco ◽  
Claudio Canali ◽  
Manfredo Manfredi ◽  
Andrea Neviani ◽  
Enrico Zanoni
1991 ◽  
Vol 70 (1) ◽  
pp. 529-531 ◽  
Author(s):  
Enrico Zanoni ◽  
Alessandro Paccagnella ◽  
Pietro Pisoni ◽  
Paolo Telaroli ◽  
Carlo Tedesco ◽  
...  

1991 ◽  
Author(s):  
D. G. Seiler ◽  
J. R. Lowney ◽  
C. L. Littler ◽  
I. T. Yoon ◽  
M. R. Loloee

1992 ◽  
Vol 284 ◽  
Author(s):  
D. J. Dimaria ◽  
E. Cartier ◽  
D. Arnold

ABSTRACTDestructive breakdown in silicon dioxide is shown to be strongly correlated to the oxide degradation caused by hot-electron-induced defect production and charge trapping ner the interfaces of the films. Two well defined transitions in the chargc-to-breakdown data as a function of field and oxide thickness are shown to coincide with the onset of mechanisms due to trap creation and impact ionization by electrons with energies exceeding 2 and 9 eV (the SiO2 bandgap energy), respectively. The temperature dependence of charge-to-breakdown is also shown to be consistent with that of these two defect-producing mechanisms.


1980 ◽  
Vol 2 ◽  
Author(s):  
S. Makram–Ebeid

ABSTRACTThe dark capacitive transients related to the main electron trap in bulk and VPE GaAs have been studied in detail. The low temperature low field transients are induced by electrons injected from the metal counter electrode. Both hot electron capture and impact ionization effects are observed. At high fields, a phonon assisted tunneling model accounts for the observations and yields the values of the Franck Condon Shift Sw and the energy w of the phonon coupled to the level. These values are found to be in good agreement with other independent estimates.


2010 ◽  
Vol 96 (5) ◽  
pp. 052115 ◽  
Author(s):  
O. Makarovsky ◽  
W. H. M. Feu ◽  
A. Patanè ◽  
L. Eaves ◽  
Q. D. Zhuang ◽  
...  

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