Correcting for diffraction in the far-infrared reflectance measurement of rough surfaces

1993 ◽  
Author(s):  
Sheldon M. Smith
1995 ◽  
Vol 389 ◽  
Author(s):  
Shaohua Liu ◽  
Peter Solomon ◽  
R. Carpio ◽  
B. Fowler ◽  
D. Simmons ◽  
...  

ABSTRACTThis paper outlines our current approach to utilize infrared reflectance spectroscopy for thin film measurement in the semiconductor industry. The multi-layer thickness and doping concentration of IC wafers can be determined by a single angle, unpolarized infrared reflectance measurement performed using Fourier transform infrared spectrometer. A computer algorithm, which matches theoretical to measured infrared reflectance spectra, was successfully employed to determine multiple thin film properties.


2006 ◽  
Vol 3 (6) ◽  
pp. 1874-1878 ◽  
Author(s):  
K. Fukui ◽  
Y. Kugumiya ◽  
N. Nakagawa ◽  
A. Yamamoto

2016 ◽  
Vol 41 (1) ◽  
pp. 109-112
Author(s):  
T. Go ◽  
H. Okamura ◽  
G. Oohata ◽  
T. Nagata ◽  
T. Moriwaki ◽  
...  

2017 ◽  
Vol 95 (21) ◽  
Author(s):  
V. Železný ◽  
O. Caha ◽  
A. Soukiassian ◽  
D. G. Schlom ◽  
X. X. Xi

2007 ◽  
Vol 42 (8) ◽  
pp. 1492-1498 ◽  
Author(s):  
M.V. Nikolić ◽  
K.M. Paraskevopoulos ◽  
O.S. Aleksić ◽  
T.T. Zorba ◽  
S.M. Savić ◽  
...  

1995 ◽  
Vol 182-184 ◽  
pp. 73-76 ◽  
Author(s):  
J. Hermans ◽  
V. Offermann ◽  
J. Woitok ◽  
J. Geurts ◽  
H. Stanzl ◽  
...  

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