Infrared reflectance measurement for InN thin film characterization

2006 ◽  
Vol 3 (6) ◽  
pp. 1874-1878 ◽  
Author(s):  
K. Fukui ◽  
Y. Kugumiya ◽  
N. Nakagawa ◽  
A. Yamamoto
Keyword(s):  
Thin Film ◽  
Infrared Reflectance ◽  
Reflectance Measurement ◽  
Thin Film Characterization

Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on Ft-Ir In-Line Sensor

1995 ◽  
Vol 389 ◽  
Author(s):  
Shaohua Liu ◽  
Peter Solomon ◽  
R. Carpio ◽  
B. Fowler ◽  
D. Simmons ◽  
...  
Keyword(s):  
Thin Film ◽  
Semiconductor Industry ◽  
Current Approach ◽  
Infrared Reflectance ◽  
Film Properties ◽  
Reflectance Measurement ◽  
Infrared Spectrometer ◽  
Ft Ir ◽  
And Control ◽  
Cluster Tool

ABSTRACTThis paper outlines our current approach to utilize infrared reflectance spectroscopy for thin film measurement in the semiconductor industry. The multi-layer thickness and doping concentration of IC wafers can be determined by a single angle, unpolarized infrared reflectance measurement performed using Fourier transform infrared spectrometer. A computer algorithm, which matches theoretical to measured infrared reflectance spectra, was successfully employed to determine multiple thin film properties.

Modeling, Simulation and Control of Single Wafer Process in Cluster Tool Base on Ft-Ir In-Line Sensor

1995 ◽  
Vol 387 ◽  
Author(s):  
Shaohua Liu ◽  
Peter Solomon ◽  
R. Carpio ◽  
B. Fowler ◽  
D. Simmons ◽  
...  
Keyword(s):  
Thin Film ◽  
Semiconductor Industry ◽  
Current Approach ◽  
Infrared Reflectance ◽  
Film Properties ◽  
Reflectance Measurement ◽  
Infrared Spectrometer ◽  
Ft Ir ◽  
And Control ◽  
Cluster Tool

AbstractThis paper outlines our current approach to utilize infrared reflectance spectroscopy for thin film measurement in the semiconductor industry. The multi-layer thickness and doping concentration of IC wafers can be determined by a single angle, unpolarized infrared reflectance measurement performed using Fourier transform infrared spectrometer. A computer algorithm, which matches theoretical tc measured infrared reflectance spectra, was successfully employed to determine multiple thin film properties.

High-temperature superconductor thin-film characterization by the modulated optical reflectance technique

1995 ◽  
Vol 8 (8) ◽  
pp. 667-672 ◽  
Author(s):  
D P Almond ◽  
A K Barker ◽  
A C Bento ◽  
S K Singh ◽  
N J Appleyard ◽  
...  
Keyword(s):  
Thin Film ◽  
High Temperature ◽  
High Temperature Superconductor ◽  
Optical Reflectance ◽  
Thin Film Characterization

Ferroelectric thin-film characterization using a coplanar waveguide bandstop filter

2006 ◽  
Vol 203 (2) ◽  
pp. 379-385
Author(s):  
Qingduan Meng ◽  
Xueqiang Zhang ◽  
Fei Li ◽  
Jiandong Huang ◽  
Xiaohong Zhu ◽  
...  
Keyword(s):  
Thin Film ◽  
Coplanar Waveguide ◽  
Ferroelectric Thin Film ◽  
Thin Film Characterization ◽  
Bandstop Filter

scholarly journals Parallel spectroscopic ellipsometry for ultra-fast thin film characterization

2020 ◽  
Vol 28 (7) ◽  
pp. 9288 ◽  
Author(s):  
Andrey Nazarov ◽  
Michael Ney ◽  
Ibrahim Abdulhalim
Keyword(s):  
Thin Film ◽  
Spectroscopic Ellipsometry ◽  
Thin Film Characterization
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