Fabrication and measurement of fused silica microlens arrays

1993 ◽  
Author(s):  
Keith O. Mersereau ◽  
Casimir R. Nijander ◽  
Avi Y. Feldblum ◽  
Wesley P. Townsend
Keyword(s):  
Fused Silica ◽  
Microlens Arrays

Multilevel kinoform microlens arrays in fused silica for high-power laser optics

2004 ◽  
Author(s):  
Victor V. Atuchin ◽  
I. S. Soldatenkov ◽  
A. V. Kirpichnikov ◽  
E. V. Mikhailov ◽  
Efim V. Pestryakov ◽  
...  
Keyword(s):  
High Power ◽  
Fused Silica ◽  
High Power Laser ◽  
Power Laser ◽  
Microlens Arrays ◽  
Laser Optics

Effect of fused silica surface wettability on thermal reflow of polymer microlens arrays

2016 ◽  
Vol 23 (6) ◽  
pp. 2193-2206 ◽  
Author(s):  
D. Jucius ◽  
V. Grigaliūnas ◽  
A. Lazauskas ◽  
E. Sapeliauskas ◽  
B. Abakevičienė ◽  
...  
Keyword(s):  
Silica Surface ◽  
Fused Silica ◽  
Surface Wettability ◽  
Microlens Arrays ◽  
Thermal Reflow

scholarly journals Improvements on the uniformity of large-area microlens arrays in Fused Silica

2019 ◽  
Vol 27 (5) ◽  
pp. 6249 ◽  
Author(s):  
Raoul Kirner ◽  
Jeremy Béguelin ◽  
Martin Eisner ◽  
Wilfried Noell ◽  
Toralf Scharf ◽  
...  
Keyword(s):  
Fused Silica ◽  
Large Area ◽  
Microlens Arrays

Fabrication of fused silica microlens arrays

1993 ◽  
Author(s):  
Mersereau ◽  
Nijander ◽  
Townsend ◽  
Feldblum
Keyword(s):  
Fused Silica ◽  
Microlens Arrays

Reactive ion etching of microlens arrays into fused silica

1994 ◽  
Author(s):  
Stefan Haselbeck ◽  
Martin Eisner ◽  
Horst Schreiber ◽  
Johannes Schwider
Keyword(s):  
Reactive Ion Etching ◽  
Fused Silica ◽  
Microlens Arrays ◽  
Ion Etching

Fabrication of concave microlens arrays by local fictive temperature modification of fused silica

2017 ◽  
Vol 42 (6) ◽  
pp. 1093 ◽  
Author(s):  
Chuanchao Zhang ◽  
Wei Liao ◽  
Ke Yang ◽  
Taixiang Liu ◽  
Yang Bai ◽  
...  
Keyword(s):  
Fused Silica ◽  
Fictive Temperature ◽  
Microlens Arrays ◽  
Temperature Modification

SEM analysis of DC magnetron sputtered beryllium films

1988 ◽  
Vol 46 ◽  
pp. 960-961
Author(s):  
E. F. Lindsey ◽  
C. W. Price ◽  
E. L. Pierce ◽  
E. J. Hsieh
Keyword(s):  
Fine Structure ◽  
Electron Emission ◽  
Secondary Electron ◽  
Low Voltage ◽  
Ion Beam ◽  
Secondary Electron Emission ◽  
Sem Analysis ◽  
Fused Silica ◽  
Grain Structure ◽  
Silica Substrate

Columnar structures produced by DC magnetron sputtering can be altered by using RF biased sputtering or by exposing the film to nitrogen pulses during sputtering, and these techniques are being evaluated to refine the grain structure in sputtered beryllium films deposited on fused silica substrates. Beryllium is brittle, and fractures in sputtered beryllium films tend to be intergranular; therefore, a convenient technique to analyze grain structure in these films is to fracture the coated specimens and examine them in an SEM. However, fine structure in sputtered deposits is difficult to image in an SEM, and both the low density and the low secondary electron emission coefficient of beryllium seriously compound this problem. Secondary electron emission can be improved by coating beryllium with Au or Au-Pd, and coating also was required to overcome severe charging of the fused silica substrate even at low voltage. The coating structure can obliterate much of the fine structure in beryllium films, but reasonable results were obtained by using the high-resolution capability of an Hitachi S-800 SEM and either ion-beam coating with Au-Pd or carbon coating by thermal evaporation.

Investigation of fused silica dynamic behaviour

2006 ◽  
Vol 134 ◽  
pp. 929-934 ◽  
Author(s):  
F. Malaise ◽  
J.-M. Chevalier ◽  
I. Bertron ◽  
F. Malka
Keyword(s):  
Dynamic Behaviour ◽  
Fused Silica
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