Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth

2008 ◽  
Vol 47 (2) ◽  
pp. 023002 ◽  
Author(s):  
Carsten Glasenapp
Keyword(s):  
Frequency Analysis ◽  
Continuous Phase ◽  
Homogeneous Structure ◽  
Maskless Lithography ◽  
Lithography System

A high-speed exposure method for digital micromirror device based scanning maskless lithography system

Optik ◽  
2019 ◽  
Vol 185 ◽  
pp. 1036-1044 ◽  
Author(s):  
Chao Peng ◽  
Zezhou Zhang ◽  
Jianxiao Zou ◽  
Wenming Chi
Keyword(s):  
High Speed ◽  
Maskless Lithography ◽  
Digital Micromirror Device ◽  
Exposure Method ◽  
Lithography System

Optofluidic Maskless Lithography System

2007 ◽  
Author(s):  
Su E. Chung ◽  
Wook Park ◽  
Hyunsung Park ◽  
Kyoungsik Yu ◽  
Namkyoo Park ◽  
...  
Keyword(s):  
Maskless Lithography ◽  
Lithography System

Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography

2016 ◽  
Vol 109 (23) ◽  
pp. 234101 ◽  
Author(s):  
Kibeom Kim ◽  
Sangkwon Han ◽  
Jinsik Yoon ◽  
Sunghoon Kwon ◽  
Hun-Kuk Park ◽  
...  
Keyword(s):  
Resolution Enhancement ◽  
Maskless Lithography ◽  
Lithography System

Position Alignment of Micro Manipulator Using Root Mean Square Errors for Maskless Lithography System

2013 ◽  
Author(s):  
Yong Seok Ihn ◽  
Sae Whan Park ◽  
Ja Choon Koo
Keyword(s):  
Micro Electro Mechanical System ◽  
Maskless Lithography ◽  
Flat Panel Display ◽  
Mems Devices ◽  
System A ◽  
The Status ◽  
Volume Production ◽  
Mean Square Errors ◽  
Lithography System ◽  
Exposure Process

A precision optical exposure process of lithography has become one of the essential processes to manufacture and develop micro electro mechanical system (MEMS) devices, flat panel display (FPD), and semiconductor. For a typical exposure process for the lithography, a photomask that is often very expensive is required to generate patterns[1]. So it is very inefficient not only in terms of cost but also the time due to the reliance on the photomasks in development. The alternative solution is the maskless lithography system, which does not use photomasks since the patterns are generated by using a digital mirror device (DMD). The unit mirror of a digital mirror device has two kinds of status which are on and off, then the status of unit mirrors configures a pattern called point array method. The maskless lithography system can reduce the amount of work forces significantly and save money as well. However, the maskless lithography system has a critical drawback, which is a low throughput since the patterns are generated in a line. This is an intrinsic problem of point array method. So in most volume production processes of maskless lithography system, a number of optical heads are used in order to maximize throughput of the expositing process. And to guarantee the exposure quality, multiple numbers of optical heads should be accurately aligned to each other, and then the focal plane of each optical head is also well aligned with chuck.

Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system

2012 ◽  
Author(s):  
G. A. Cirino ◽  
S. A. Lopera ◽  
A. N. Montagnoli ◽  
L. G. Neto ◽  
R. D. Mansano
Keyword(s):  
Low Cost ◽  
Microlens Array ◽  
Maskless Lithography ◽  
Lithography System

Fabrication of passive micromixer using a digital micromirror device-based maskless lithography system

2014 ◽  
Vol 15 (7) ◽  
pp. 1417-1422 ◽  
Author(s):  
Yong-Kyu Cho ◽  
Tae-Heon Han ◽  
Seok-Jae Ha ◽  
Jung-Won Lee ◽  
Jong-Su Kim ◽  
...  
Keyword(s):  
Maskless Lithography ◽  
Digital Micromirror Device ◽  
Passive Micromixer ◽  
Lithography System

Architecture for next-generation massively parallel maskless lithography system (MPML2)

2010 ◽  
Author(s):  
Ming-Shing Su ◽  
Kuen-Yu Tsai ◽  
Yi-Chang Lu ◽  
Yu-Hsuan Kuo ◽  
Ting-Hang Pei ◽  
...  
Keyword(s):  
Massively Parallel ◽  
Maskless Lithography ◽  
Next Generation ◽  
Lithography System

scholarly journals Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels

2007 ◽  
Vol 91 (4) ◽  
pp. 041106 ◽  
Author(s):  
Su Eun Chung ◽  
Wook Park ◽  
Hyunsung Park ◽  
Kyoungsik Yu ◽  
Namkyoo Park ◽  
...  
Keyword(s):  
Real Time ◽  
Microfluidic Channels ◽  
Maskless Lithography ◽  
Lithography System
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