scholarly journals Optofluidic maskless lithography system for real-time synthesis of photopolymerized microstructures in microfluidic channels

2007 ◽  
Vol 91 (4) ◽  
pp. 041106 ◽  
Author(s):  
Su Eun Chung ◽  
Wook Park ◽  
Hyunsung Park ◽  
Kyoungsik Yu ◽  
Namkyoo Park ◽  
...  
Keyword(s):  
Real Time ◽  
Microfluidic Channels ◽  
Maskless Lithography ◽  
Lithography System

Demonstration of real-time pattern correction for high-throughput maskless lithography

2011 ◽  
Author(s):  
E. A. Hakkennes ◽  
A. D. Wiersma ◽  
M. Hoving ◽  
N. Venema ◽  
S. Woutersen ◽  
...  
Keyword(s):  
Real Time ◽  
High Throughput ◽  
Maskless Lithography ◽  
Time Pattern

Microfluidic Gas Sensing with Living Microbial Cells Confined in a Microaquarium

2013 ◽  
Vol 543 ◽  
pp. 431-434 ◽  
Author(s):  
Kazunari Ozasa ◽  
Jee Soo Lee ◽  
Simon Song ◽  
Masahiko Hara ◽  
Mizuo Maeda
Keyword(s):  
Real Time ◽  
Concentration Gradient ◽  
Gas Sensing ◽  
Bacterial Chemotaxis ◽  
Optical Microscope ◽  
Sensor Chip ◽  
Microfluidic Channels ◽  
Microbial Cells ◽  
Gas Molecules ◽  
On Chip

We investigated on-chip cytotoxicity gas sensing using the bacterial chemotaxis of Euglena confined in a microaquarium. The sensor chip made from PDMS had one microaquarium and two microfluidic channels passing aside of the microaquarium. The chemotactic microbial cells were confined in the microaquarium, whereas two gases (one sample and one reference) flowed in the two isolated microchannels. Gas molecules move from the microchannels into the microaquarium by permeation through porous PDMS wall, and dissolve into the water in the microaquarium, where Euglena cells are swimming. The chemotactic movements of Euglena were observed with an optical microscope and measured as traces in real time. By injecting CO2 and air into each microchannel separately, the Euglena cells in the microaquarium moved to air side, escaping from CO2. This observation showed that the concentration gradient of CO2 was produced in the water in the microaquarium. The CO2-avoiding movement of Euglena was increased largely at a CO2 concentration of 40%, and then moderately increased above 60%. Some Euglena cells stopped swimming at the air side of the microaquarium and remained there even after CO2 has been removed, which can be used as the indicator of CO2 history.

A high-speed exposure method for digital micromirror device based scanning maskless lithography system

Optik ◽  
2019 ◽  
Vol 185 ◽  
pp. 1036-1044 ◽  
Author(s):  
Chao Peng ◽  
Zezhou Zhang ◽  
Jianxiao Zou ◽  
Wenming Chi
Keyword(s):  
High Speed ◽  
Maskless Lithography ◽  
Digital Micromirror Device ◽  
Exposure Method ◽  
Lithography System

Optofluidic Maskless Lithography System

2007 ◽  
Author(s):  
Su E. Chung ◽  
Wook Park ◽  
Hyunsung Park ◽  
Kyoungsik Yu ◽  
Namkyoo Park ◽  
...  
Keyword(s):  
Maskless Lithography ◽  
Lithography System

Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography

2016 ◽  
Vol 109 (23) ◽  
pp. 234101 ◽  
Author(s):  
Kibeom Kim ◽  
Sangkwon Han ◽  
Jinsik Yoon ◽  
Sunghoon Kwon ◽  
Hun-Kuk Park ◽  
...  
Keyword(s):  
Resolution Enhancement ◽  
Maskless Lithography ◽  
Lithography System

Position Alignment of Micro Manipulator Using Root Mean Square Errors for Maskless Lithography System

2013 ◽  
Author(s):  
Yong Seok Ihn ◽  
Sae Whan Park ◽  
Ja Choon Koo
Keyword(s):  
Micro Electro Mechanical System ◽  
Maskless Lithography ◽  
Flat Panel Display ◽  
Mems Devices ◽  
System A ◽  
The Status ◽  
Volume Production ◽  
Mean Square Errors ◽  
Lithography System ◽  
Exposure Process

A precision optical exposure process of lithography has become one of the essential processes to manufacture and develop micro electro mechanical system (MEMS) devices, flat panel display (FPD), and semiconductor. For a typical exposure process for the lithography, a photomask that is often very expensive is required to generate patterns[1]. So it is very inefficient not only in terms of cost but also the time due to the reliance on the photomasks in development. The alternative solution is the maskless lithography system, which does not use photomasks since the patterns are generated by using a digital mirror device (DMD). The unit mirror of a digital mirror device has two kinds of status which are on and off, then the status of unit mirrors configures a pattern called point array method. The maskless lithography system can reduce the amount of work forces significantly and save money as well. However, the maskless lithography system has a critical drawback, which is a low throughput since the patterns are generated in a line. This is an intrinsic problem of point array method. So in most volume production processes of maskless lithography system, a number of optical heads are used in order to maximize throughput of the expositing process. And to guarantee the exposure quality, multiple numbers of optical heads should be accurately aligned to each other, and then the focal plane of each optical head is also well aligned with chuck.

Real-Time Sizing of Nanoparticles in Microfluidic Channels Using Confocal Correlation Spectroscopy

2006 ◽  
Vol 128 (3) ◽  
pp. 730-731 ◽  
Author(s):  
Christopher L. Kuyper ◽  
Kristi L. Budzinski ◽  
Robert M. Lorenz ◽  
Daniel T. Chiu
Keyword(s):  
Real Time ◽  
Correlation Spectroscopy ◽  
Microfluidic Channels

Low-cost Fresnel microlens array fabricated by a home-built maskless lithography system

2012 ◽  
Author(s):  
G. A. Cirino ◽  
S. A. Lopera ◽  
A. N. Montagnoli ◽  
L. G. Neto ◽  
R. D. Mansano
Keyword(s):  
Low Cost ◽  
Microlens Array ◽  
Maskless Lithography ◽  
Lithography System
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