Limitations of proximity-effect corrections for electron-beam patterning of planar photonic crystals

2005 ◽  
Vol 44 (4) ◽  
pp. 043401 ◽  
Author(s):  
Robert Wu¨est
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Proximity Effect ◽  
Electron Beam Patterning

Limitations of proximity-effect correction for electron-beam patterning of photonic crystals

2004 ◽  
Author(s):  
Robert Wuest ◽  
Christoph Hunziker ◽  
Franck Robin ◽  
Patric Strasser ◽  
Daniel Erni ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Proximity Effect ◽  
Electron Beam Patterning ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

scholarly journals Proximity Effect Aware Detailed Placement in Electron Beam Lithography

2018 ◽  
Vol 232 ◽  
pp. 04046
Author(s):  
Yuhang Chen ◽  
Zhipeng Huang ◽  
Xiongfeng Chen ◽  
Jianli Chen ◽  
Wenxing Zhu
Keyword(s):  
Electron Beam ◽  
Objective Function ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
State Of The Art ◽  
Experimental Result ◽  
Accurate Evaluation ◽  
Evaluation Scheme ◽  
Gauss Transform ◽  
Detailed Placement

Proximity effect is one of the most tremendous consequences that produces unacceptable exposures during electron beam lithography (EBL), and thus distorting the layout pattern. In this paper, we propose the first work which considers the proximity effect during layout stage. We first give an accurate evaluation scheme to estimate the proximity effect by fast Gauss transform. Then, we devote a proximity effect aware detailed placement objective function to simultaneously consider wirelength, density and proximity effect. Furthermore, cell swapping and cell matching based methods are used to optimize the objective function such that there is no overlap among cells. Compared with a state-of-the-art work, experimental result shows that our algorithm can efficiently reduce the proximity variations and maintain high wirelength quality at a reasonable runtime.

Proximity and heating effects during electron-beam patterning of ultraviolet lithography masks

2002 ◽  
Vol 20 (6) ◽  
pp. 3029 ◽  
Author(s):  
B. Lu ◽  
J. R. Wasson ◽  
E. J. Weisbrod ◽  
Z. Masnyj ◽  
P. J. S. Mangat ◽  
...  
Keyword(s):  
Electron Beam ◽  
Ultraviolet Lithography ◽  
Heating Effects ◽  
Electron Beam Patterning

Dendrimer-Scaffold-Based Electron-Beam Patterning of Biomolecules

2006 ◽  
Vol 18 (3) ◽  
pp. 315-319 ◽  
Author(s):  
P. Bhatnagar ◽  
S. S. Mark ◽  
I. Kim ◽  
H. Chen ◽  
B. Schmidt ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Patterning
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