Gas-phase surface functionalization of SiNx with benzaldehyde to increase SiO2 to SiNx etch selectivity in atomic layer etching

Ryan J. Gasvoda; Zhonghao Zhang; Eric A. Hudson; Sumit Agarwal

doi:10.1116/6.0001046

Gas-phase surface functionalization of SiNx with benzaldehyde to increase SiO2 to SiNx etch selectivity in atomic layer etching

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/6.0001046 ◽

2021 ◽

Vol 39 (4) ◽

pp. 040401

Author(s):

Ryan J. Gasvoda ◽

Zhonghao Zhang ◽

Eric A. Hudson ◽

Sumit Agarwal

Keyword(s):

Gas Phase ◽

Surface Functionalization ◽

Atomic Layer ◽

Phase Surface ◽

Atomic Layer Etching

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Vapor Phase Surface Functionalization using Atomic Layer Deposition (ALD) and Self Assembled Molecules (SAMs)

ECS Meeting Abstracts ◽

10.1149/ma2013-02/24/1861 ◽

2013 ◽

Keyword(s):

Atomic Layer Deposition ◽

Vapor Phase ◽

Surface Functionalization ◽

Atomic Layer ◽

Layer Deposition ◽

Self Assembled ◽

Phase Surface

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(Invited) Vapor Phase Surface Functionalization Using Atomic Layer Deposition (ALD) and Self Assembled Molecules (SAMs)

ECS Transactions ◽

10.1149/05810.0027ecst ◽

2013 ◽

Vol 58 (10) ◽

pp. 27-37

Author(s):

G. M. Sundaram ◽

L. Lecordier ◽

R. Bhatia

Keyword(s):

Atomic Layer Deposition ◽

Vapor Phase ◽

Surface Functionalization ◽

Atomic Layer ◽

Layer Deposition ◽

Self Assembled ◽

Phase Surface

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Gas-phase surface functionalization of multi-walled carbon nanotubes with vacuum UV photo-oxidation

Journal of Adhesion Science and Technology ◽

10.1163/156856107781393893 ◽

2007 ◽

Vol 21 (10) ◽

pp. 999-1007 ◽

Cited By ~ 8

Author(s):

M. Krysak ◽

B. Parekh ◽

T. Debies ◽

R. A. Dileo ◽

B. J. Landi ◽

...

Keyword(s):

Carbon Nanotubes ◽

Gas Phase ◽

Surface Functionalization ◽

Photo Oxidation ◽

Multi Walled Carbon Nanotubes ◽

Phase Surface ◽

Walled Carbon Nanotubes ◽

Vacuum Uv

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Gas-Phase Surface Functionalization of Carbon Nanotubes With UV Photo-Oxidation

Polymer Surface Modification: Relevance to Adhesion, Volume 5 ◽

10.1201/b12243-11 ◽

2009 ◽

pp. 135-148

Keyword(s):

Carbon Nanotubes ◽

Gas Phase ◽

Surface Functionalization ◽

Photo Oxidation ◽

Phase Surface ◽

Functionalization Of Carbon Nanotubes

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Chemical Protection of Material Morphology: Robust and Gentle Gas-Phase Surface Functionalization of ZnO with Propiolic Acid

Chemistry of Materials ◽

10.1021/acs.chemmater.7b00747 ◽

2017 ◽

Vol 29 (9) ◽

pp. 4063-4071 ◽

Cited By ~ 10

Author(s):

Fei Gao ◽

Soraya Aminane ◽

Shi Bai ◽

Andrew V. Teplyakov

Keyword(s):

Gas Phase ◽

Surface Functionalization ◽

Chemical Protection ◽

Propiolic Acid ◽

Phase Surface

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Gas-Phase Surface Functionalization Of Carbon Nanotubes With UV Photo-Oxidation

Polymer Surface Modification: Relevance to Adhesion, Volume 5 ◽

10.1163/ej.9789004165908.i-394.67 ◽

2010 ◽

pp. 125-138 ◽

Cited By ~ 5

Author(s):

M. Krysak ◽

B. Parekh ◽

B. J. Landi ◽

T. Debies ◽

G. A. Takacs ◽

...

Keyword(s):

Carbon Nanotubes ◽

Gas Phase ◽

Surface Functionalization ◽

Photo Oxidation ◽

Phase Surface ◽

Functionalization Of Carbon Nanotubes

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A comparison of liquid and gas phase surface preparation of III–V compound semiconductors for atomic layer deposition

Microelectronic Engineering ◽

10.1016/j.mee.2008.07.004 ◽

2009 ◽

Vol 86 (2) ◽

pp. 122-127 ◽

Cited By ~ 10

Author(s):

F.L. Lie ◽

W. Rachmady ◽

A.J. Muscat

Keyword(s):

Atomic Layer Deposition ◽

Gas Phase ◽

Surface Preparation ◽

Compound Semiconductors ◽

Atomic Layer ◽

Layer Deposition ◽

Phase Surface

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Atomic Layer Deposition on Dental Materials: Processing Conditions and Surface Functionalization to Improve Properties - a Critical Review

SSRN Electronic Journal ◽

10.2139/ssrn.3676001 ◽

2020 ◽

Author(s):

Sarah Hashemi Astaneh ◽

Leonardo P. Faverani ◽

Cortino Sukotjo ◽

Christos G. Takoudis

Keyword(s):

Atomic Layer Deposition ◽

Surface Functionalization ◽

Critical Review ◽

Dental Materials ◽

Atomic Layer ◽

Materials Processing ◽

Processing Conditions ◽

Layer Deposition

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Molecular dynamics simulation of atomic layer etching of silicon

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.579659 ◽

1995 ◽

Vol 13 (3) ◽

pp. 966-971 ◽

Cited By ~ 70

Author(s):

Satish D. Athavale ◽

Demetre J. Economou

Keyword(s):

Molecular Dynamics ◽

Molecular Dynamics Simulation ◽

Atomic Layer ◽

Dynamics Simulation ◽

Atomic Layer Etching

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Damaged silicon contact layer removal using atomic layer etching for deep-nanoscale semiconductor devices

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.4823335 ◽

2013 ◽

Vol 31 (6) ◽

pp. 061310 ◽

Cited By ~ 9

Author(s):

Jong Kyu Kim ◽

Sung Il Cho ◽

Sung Ho Lee ◽

Chan Kyu Kim ◽

Kyung Suk Min ◽

...

Keyword(s):

Semiconductor Devices ◽

Atomic Layer ◽

Contact Layer ◽

Layer Removal ◽

Atomic Layer Etching

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