Atmospheric pressure plasma reduction of copper oxide to copper metal

2021 ◽  
Vol 39 (2) ◽  
pp. 023001
Author(s):  
Joyce Lee ◽  
Thomas S. Williams ◽  
Robert F. Hicks
Keyword(s):  
Copper Oxide ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Copper Metal ◽  
Pressure Plasma ◽  
Plasma Reduction

Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II - Characterization of the Films

2016 ◽  
Vol 13 (8) ◽  
pp. 766-774 ◽  
Author(s):  
Johannes Gruenwald ◽  
Katja Fricke ◽  
Maik Fröhlich ◽  
Jürgen F. Kolb ◽  
Martin Polak
Keyword(s):  
Copper Oxide ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Plasma Source ◽  
Oxide Coatings ◽  
Pressure Plasma

Ultrasonic Wave Detection in Atmospheric Pressure Plasma Using Fraunhofer Diffraction Effect

PIERS Online ◽  
2010 ◽  
Vol 6 (7) ◽  
pp. 636-639
Author(s):  
Toshiyuki Nakamiya ◽  
Fumiaki Mitsugi ◽  
Shota Suyama ◽  
Tomoaki Ikegami ◽  
Yoshito Sonoda ◽  
...  
Keyword(s):  
Ultrasonic Wave ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Diffraction Effect ◽  
Fraunhofer Diffraction ◽  
Wave Detection ◽  
Pressure Plasma

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

Effects of iodine dopant on atmospheric pressure plasma polymerized pyrrole in remote and coupling methods

2018 ◽  
Vol 677 (1) ◽  
pp. 135-142
Author(s):  
Dong Ha Kim ◽  
Choon-Sang Park ◽  
Eun Young Jung ◽  
Bhum Jae Shin ◽  
Jae Young Kim ◽  
...  
Keyword(s):  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Pressure Plasma ◽  
Coupling Methods
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