Deposition of Copper Oxide Coatings with an Atmospheric Pressure Plasma Source: II - Characterization of the Films

2016 ◽  
Vol 13 (8) ◽  
pp. 766-774 ◽  
Author(s):  
Johannes Gruenwald ◽  
Katja Fricke ◽  
Maik Fröhlich ◽  
Jürgen F. Kolb ◽  
Martin Polak
2007 ◽  
Vol 35 (5) ◽  
pp. 1480-1485 ◽  
Author(s):  
Dustin L. Sullivan ◽  
Mark A. Kemp ◽  
Scott D. Kovaleski

2020 ◽  
Vol 35 (10) ◽  
pp. 2369-2377
Author(s):  
Helmar Wiltsche ◽  
Matthias Wolfgang

The MICAP is a microwave driven plasma source employing nitrogen as the plasma gas. In this work we compare LODs and LOQs obtained in axial viewing with those obtained by ICP-OES and evaluate the effect of air instead of nitrogen as the plasma gas.


2012 ◽  
Vol 21 (3) ◽  
pp. 034017 ◽  
Author(s):  
E Robert ◽  
V Sarron ◽  
D Riès ◽  
S Dozias ◽  
M Vandamme ◽  
...  

2015 ◽  
Vol 43 (3) ◽  
pp. 713-725 ◽  
Author(s):  
Marco Boselli ◽  
Vittorio Colombo ◽  
Matteo Gherardi ◽  
Romolo Laurita ◽  
Anna Liguori ◽  
...  

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