Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability

2021 ◽  
Vol 39 (1) ◽  
pp. 012602
Author(s):  
Mandy Grube ◽  
Benjamin Schille ◽  
Matthias Schirmer ◽  
Maik Gerngroß ◽  
Uwe Hübner ◽  
...  
Keyword(s):  
Shelf Life ◽  
High Sensitivity ◽  
Hydrogen Silsesquioxane ◽  
Negative Tone

Nanostructuring Techniques for 3C-SiC(100) NEMS Structures

2010 ◽  
Vol 645-648 ◽  
pp. 841-844 ◽  
Author(s):  
Manuel Hofer ◽  
Thomas Stauden ◽  
Ivo W. Rangelow ◽  
Jörg Pezoldt
Keyword(s):  
Electron Beam ◽  
Crystallographic Orientation ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Dry Etching ◽  
Hydrogen Silsesquioxane ◽  
Free Standing ◽  
Feature Size ◽  
Etching Mask ◽  
Negative Tone

In this work nanostructures based on a 30 nm thick 3C-SiC (100) heteroepitaxially grown on Si(100) are demonstrated. They consist of free standing nanoresonators with dimensions below 50 nm. The free standing nanostructures and resonators were defined by electron beam lithography using hydrogen silsesquioxane (HSQ) as a negative tone e-beam resist acting as a selective etching mask during the anisotropic and isotropic dry etching. The influences of the proximity effect, the crystallographic orientation, the angle of exposing on the feature size are highlighted.

Water-developable negative-tone single-molecule resists: high-sensitivity nonchemically amplified resists

2008 ◽  
Author(s):  
Richard A. Lawson ◽  
Cheng-Tsung Lee ◽  
Wang Yueh ◽  
Laren Tolbert ◽  
Clifford L. Henderson
Keyword(s):  
Single Molecule ◽  
High Sensitivity ◽  
Negative Tone

scholarly journals Comparison of the Carba NP, Modified Carba NP, and Updated Rosco Neo-Rapid Carb Kit Tests for Carbapenemase Detection

2015 ◽  
Vol 53 (11) ◽  
pp. 3539-3542 ◽  
Author(s):  
Sameh AbdelGhani ◽  
Gina K. Thomson ◽  
James W. Snyder ◽  
Kenneth S. Thomson
Keyword(s):  
Shelf Life ◽  
High Sensitivity ◽  
Reference Standard ◽  
Class A ◽  
Clinical Laboratories ◽  
Extended Spectrum ◽  
Accurate Detection ◽  
Limited Spectrum ◽  
Negative Controls

The accurate detection of carbapenemase-producing organisms is a major challenge for clinical laboratories. The Carba NP test is highly accurate but inconvenient, as it requires frequent preparation of fresh imipenem solution. The current study was designed to compare the Carba NP test to two alternative tests for accuracy and convenience. These were a modified Carba NP test that utilized intravenous (i.v.) imipenem-cilastatin, which is less expensive than reference standard imipenem powder, and an updated version of the Rosco Neo-Rapid Carb kit, which does not require the preparation of imipenem solution and has a shelf life of 2 years. The comparison included 87 isolates that produced class A carbapenemases (including KPC-2, -3, -4, -5, -6, and -8, NMC-A, and SME type), 40 isolates that produced metallo-β-lactamases (including NDM-1, GIM-1, SPM-1, IMP-1, -2, -7, -8, -18, and -27, and VIM-1, -2, and -7), 11 isolates that produced OXA-48, and one isolate that produced OXA-181. Negative controls consisted of 50 isolates that produced extended-spectrum β-lactamases (ESBLs), AmpCs (including hyperproducers), K1, other limited-spectrum β-lactamases, and porin and efflux mutants. Each test exhibited 100% specificity and high sensitivity (Carba NP, 100%; Rosco, 99% using modified interpretation guidelines; and modified Carba NP, 96%). A modified approach to interpretation of the Rosco test was necessary to achieve the sensitivity of 99%. If the accuracy of the modified interpretation is confirmed, the Rosco test is an accurate and more convenient alternative to the Carba NP test.

Negative-Tone Molecular Resist with High-Sensitivity for EUV and EB Lithography

2007 ◽  
Author(s):  
K. Kojima ◽  
S. Mori ◽  
H. Hada ◽  
D. Shiono ◽  
J. Onodera ◽  
...  
Keyword(s):  
High Sensitivity ◽  
Negative Tone

Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies

2002 ◽  
Vol 61-62 ◽  
pp. 803-809 ◽  
Author(s):  
M. Peuker ◽  
M.H. Lim ◽  
Henry I. Smith ◽  
R. Morton ◽  
A.K. van Langen-Suurling ◽  
...  
Keyword(s):  
High Resolution ◽  
Hydrogen Silsesquioxane ◽  
Negative Tone
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