Simulation based plasma reactor design for improved ion bombardment uniformity

2000 ◽  
Vol 18 (2) ◽  
pp. 841 ◽  
Author(s):  
Heon Chang Kim ◽  
Vasilios I. Manousiouthakis
Keyword(s):  
Plasma Reactor ◽  
Ion Bombardment ◽  
Reactor Design ◽  
Simulation Based

scholarly journals Microbubble-enhanced DBD plasma reactor: Design, characterisation and modelling

2019 ◽  
Vol 144 ◽  
pp. 159-173 ◽  
Author(s):  
Alexander Wright ◽  
Matteo Taglioli ◽  
Faraz Montazersadgh ◽  
Alex Shaw ◽  
Felipe Iza ◽  
...  
Keyword(s):  
Plasma Reactor ◽  
Reactor Design ◽  
Dbd Plasma

Effect of Ion Bombardment on the Structure and Properties of PECVD SiO2

1994 ◽  
Vol 363 ◽  
Author(s):  
Jung H. Lee ◽  
Dong S. Kim ◽  
Young H. Lee
Keyword(s):  
Plasma Reactor ◽  
Substrate Surface ◽  
Emission Spectra ◽  
Optical Emission ◽  
Ion Bombardment ◽  
Ion Energy ◽  
On Line ◽  
Spectrometer Data ◽  
Optical Emission Spectra ◽  
Deposited Films

AbstractSiO2 films were deposited on silicon wafers at 25°C by plasma enhanced decomposition of tetraethoxysilane (TEOS) in a mixture of argon and oxygen. The deposition was performed in a rf-powered (13.56 MIHz) asymmetric plasma reactor. The effect of ion bombardment was evaluated by varying the ion energy flux (IEF) at the substrate surface from 0.93 to 9.94 W/cm2. On-line optical emission spectra (OES) revealed CO, CH, and H peaks whose absorption intensities increased with increasing applied power. On-line mass spectrometer data showed that the peak intensities of OC2H5, SiOH (m/e=45), and HSiOH (m/e=46) fragments decreased with increasing applied power indicating the decomposition of these species. FTIR spectra of the deposited films showed that the concentrations of Si-OH and trapped CO gases in the film decreased with increasing IEF. Also, the FTIR results and the refractive index measurements indicated that the film density increased as a function of IEF. The stoichiometry of the film did not change when IEF was below 2, but for IEF greater than 4.91 W/cm2, the film became Si-rich.

scholarly journals A new methodology for the reduction of vibrational kinetics in non-equilibrium microwave plasma: application to CO2 dissociation

2016 ◽  
Vol 1 (5) ◽  
pp. 540-554 ◽  
Author(s):  
J. F. de la Fuente ◽  
S. H. Moreno ◽  
A. I. Stankiewicz ◽  
G. D. Stefanidis
Keyword(s):  
Kinetic Models ◽  
Microwave Plasma ◽  
Plasma Reactor ◽  
Reactor Design ◽  
Renewable Electricity ◽  
Design And Optimization ◽  
Fuels And Chemicals ◽  
Vibrational Kinetics ◽  
Non Equilibrium

Plasma reactor technologies have the potential to enable storage of green renewable electricity into fuels and chemicals. The development of reduced kinetic models is key for efficient plasma reactor design and optimization.

Effect of ion Bombardment in Polymer Surface Modification: Comparison of Pulsed High Frequency Plasma and ion Beam

1998 ◽  
Vol 544 ◽  
Author(s):  
O. Zabeida ◽  
J. E. Klemberg-Sapieha ◽  
L. Martinu ◽  
D. Morton
Keyword(s):  
Microwave Plasma ◽  
Ion Beam ◽  
Plasma Reactor ◽  
Polymer Surface ◽  
Ion Bombardment ◽  
Ion Source ◽  
Distribution Functions ◽  
Surface Restructuring ◽  
Microstructure Density ◽  
Energy Distribution Functions

AbstractThe energy and the flux of impinging ions are important factors which determine the properties of deposited films and of exposed surfaces (microstructure, density, hardness, roughness, stress, chemical structure, adhesion etc.). In the present work, we use a multigrid retarding field analyzer to study ion bombardment characteristics in two different systems: a pulsed microwave plasma reactor, and a cold cathode ion source. We have found that the ion energy distribution functions (IEDF) possess specific features for each mode of operation: we evaluate the shape and the maximum and the mean ion energies of the IEDF for different gases such as Ar and N2. These ion characteristics are correlated with surface restructuring of differently treated polymers (polycarbonate and polyethylene terephthalate), analyzed by XPS.

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