Depth profiling of ultrashallow B implants in silicon using a magnetic-sector secondary ion mass spectrometry instrument

2000 ◽  
Vol 18 (1) ◽  
pp. 519 ◽  
Author(s):  
E. Napolitani ◽  
A. Carnera ◽  
R. Storti ◽  
V. Privitera ◽  
F. Priolo ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Magnetic Sector ◽  
Mass Spectrometry Instrument ◽  
Ion Mass Spectrometry ◽  
Secondary Ion

Round-robin test for the measurement of layer thickness of multilayer films by secondary ion mass spectrometry depth profiling

2017 ◽  
Vol 49 (11) ◽  
pp. 1057-1063 ◽  
Author(s):  
Kyung Joong Kim ◽  
Jong Shik Jang ◽  
Joe Bennett ◽  
David Simons ◽  
Mario Barozzi ◽  
...  
Keyword(s):  
Mass Spectrometry ◽  
Layer Thickness ◽  
Secondary Ion Mass Spectrometry ◽  
Depth Profiling ◽  
Multilayer Films ◽  
Round Robin ◽  
Round Robin Test ◽  
Ion Mass Spectrometry ◽  
Secondary Ion
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