Extension of deep-ultraviolet lithography for patterning logic gates using alternating phase shifting masks

1999 ◽  
Vol 17 (6) ◽  
pp. 3296 ◽  
Author(s):  
Chen-Cheng Kuo ◽  
Chia-Hui Lin ◽  
Hua-Tai Lin ◽  
Anthony Yen
Keyword(s):  
Logic Gates ◽  
Phase Shifting ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

The Application of Silicon Rich Nitride Films for Use as Deep-Ultraviolet Lithography Phase-Shifting Masks

1998 ◽  
Vol 37 (Part 1, No. 2) ◽  
pp. 571-576 ◽  
Author(s):  
Zhong-Tao Jiang ◽  
Tomuo Yamaguchi ◽  
Kentaro Ohshimo ◽  
Mitsuru Aoyama ◽  
Leo Asinovsky
Keyword(s):  
Phase Shifting ◽  
Ultraviolet Lithography ◽  
Deep Ultraviolet

Alternating phase shifting mask implementation to 0.1-μm logic gates

2002 ◽  
Author(s):  
Chung-Hsing Chang ◽  
San-De Tzu ◽  
Chen-Hao Hsieh ◽  
Chang-Min Dai ◽  
Burn J. Lin ◽  
...  
Keyword(s):  
Logic Gates ◽  
Phase Shifting

Nanofabrication with deep-ultraviolet lithography and resolution enhancements

1999 ◽  
Vol 17 (6) ◽  
pp. 3310 ◽  
Author(s):  
M. Fritze ◽  
S. Palmateer ◽  
P. Maki ◽  
J. Knecht ◽  
C. K. Chen ◽  
...  
Keyword(s):  
Ultraviolet Lithography ◽  
Deep Ultraviolet
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