Erratum: “Low temperature metalorganic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization” [J. Vac. Sci. Technol. B 17, 1101 (1999)]

Jean E. Kelsey; Cindy Goldberg; Guilleromo Nuesca; Gregory Peterson; Alain E. Kaloyeros; Barry Arkles

doi:10.1116/1.590892

Erratum: “Low temperature metalorganic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization” [J. Vac. Sci. Technol. B 17, 1101 (1999)]

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590892 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2193

Author(s):

Jean E. Kelsey ◽

Cindy Goldberg ◽

Guilleromo Nuesca ◽

Gregory Peterson ◽

Alain E. Kaloyeros ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Copper Metallization ◽

Tungsten Nitride ◽

Metalorganic Chemical

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Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590703 ◽

1999 ◽

Vol 17 (3) ◽

pp. 1101 ◽

Cited By ~ 41

Author(s):

Jean E. Kelsey ◽

Cindy Goldberg ◽

Guillermo Nuesca ◽

Gregory Peterson ◽

Alain E. Kaloyeros ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Copper Metallization ◽

Organic Chemical ◽

Tungsten Nitride ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Structural and electrical properties of BaTiO3thin films grown onp‐InSb substrate by metalorganic chemical vapor deposition at low temperature

Applied Physics Letters ◽

10.1063/1.109550 ◽

1993 ◽

Vol 62 (15) ◽

pp. 1788-1790 ◽

Cited By ~ 16

Author(s):

T. W. Kim ◽

M. Jung ◽

H. J. Kim ◽

Y. S. Yoon ◽

W. N. Kang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Structural And Electrical Properties ◽

Metalorganic Chemical

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High speed metal‐semiconductor‐metal photodetector manufactured on GaAs by low‐temperature photoassisted metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.114129 ◽

1995 ◽

Vol 66 (26) ◽

pp. 3651-3653 ◽

Cited By ~ 3

Author(s):

K. S. Boutros ◽

J. C. Roberts ◽

S. M. Bedair ◽

T. F. Carruthers ◽

M. Y. Frankel

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

High Speed ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metal Semiconductor Metal ◽

Metalorganic Chemical

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Low Temperature Fabrication Of YBa2Cu3O7−x High-Tc Superconducting Thin Films By Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Science and Technology of Thin Film Superconductors 2 ◽

10.1007/978-1-4684-1345-8_32 ◽

1990 ◽

pp. 217-222

Author(s):

J. Zhao ◽

D. W. Noh ◽

C. S. Chern ◽

Y. Q. Li ◽

P. Norris ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

High Tc ◽

Metalorganic Chemical

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Thermal metalorganic chemical vapor deposition of Ti-Si-N films for diffusion barrier applications

10.2172/219352 ◽

1996 ◽

Author(s):

J.S. Custer ◽

P.M. Smith ◽

R.V. Jones ◽

A.W. Maverick ◽

D.A. Roberts ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Diffusion Barrier ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Metalorganic Chemical

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Hydrogen beam stimulated low‐temperature dissociation of organometallics—application for lowering the growth temperature in a metalorganic chemical vapor deposition process

Applied Physics Letters ◽

10.1063/1.103004 ◽

1990 ◽

Vol 56 (20) ◽

pp. 2019-2021 ◽

Cited By ~ 4

Author(s):

G. V. Jagannathan ◽

Merrill L. Andrews ◽

Alec T. Habig

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Growth Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Deposition Process ◽

Chemical Vapor Deposition Process ◽

Hydrogen Beam ◽

Metalorganic Chemical

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Low‐temperature luminescent properties of degeneratep‐type GaAs grown by low‐pressure metalorganic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.356283 ◽

1994 ◽

Vol 75 (4) ◽

pp. 2210-2214 ◽

Cited By ~ 13

Author(s):

H. D. Chen ◽

M. S. Feng ◽

P. A. Chen ◽

K. C. Lin ◽

C. C. Wu

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Luminescent Properties ◽

Low Pressure ◽

Metalorganic Chemical

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Structure of high resistivity GaAs film grown by low‐temperature metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.118022 ◽

1996 ◽

Vol 69 (21) ◽

pp. 3239-3241

Author(s):

Wen‐Chung Chen ◽

C.‐S. Chang ◽

S. H. Chan

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

High Resistivity ◽

Gaas Film ◽

Metalorganic Chemical

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Preparation and characterization of thin films of copper(II) oxide by low temperature normal pressure metalorganic chemical vapor deposition

Materials Research Bulletin ◽

10.1016/0025-5408(89)90128-1 ◽

1989 ◽

Vol 24 (2) ◽

pp. 213-219 ◽

Cited By ~ 15

Author(s):

Angus B. Laurie ◽

Michael L. Norton

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Normal Pressure ◽

Metalorganic Chemical

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Low temperature deposition of Ba1-xSrxTiO3 thin films by ECR plasma-enhanced metalorganic chemical vapor deposition

Integrated Ferroelectrics ◽

10.1080/10584589808202076 ◽

1998 ◽

Vol 21 (1-4) ◽

pp. 355-366 ◽

Cited By ~ 3

Author(s):

S. R. Gilbert ◽

S. R. Summerfelt ◽

T. S. Moise ◽

J. M. Anthony

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Ecr Plasma ◽

Low Temperature Deposition ◽

Temperature Deposition ◽

Metalorganic Chemical

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