scholarly journals Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization

1999 ◽  
Vol 17 (3) ◽  
pp. 1101 ◽  
Author(s):  
Jean E. Kelsey ◽  
Cindy Goldberg ◽  
Guillermo Nuesca ◽  
Gregory Peterson ◽  
Alain E. Kaloyeros ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Diffusion Barrier ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Copper Metallization ◽  
Organic Chemical ◽  
Tungsten Nitride ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

Transparent conducting indium oxide thin films grown by low-temperature metal organic chemical vapor deposition

2007 ◽  
Vol 515 (5) ◽  
pp. 2921-2925 ◽  
Author(s):  
Chunyu Wang ◽  
Volker Cimalla ◽  
Genady Cherkashinin ◽  
Henry Romanus ◽  
Majdeddin Ali ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Low Temperature ◽  
Indium Oxide ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organic Chemical ◽  
Transparent Conducting ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition
Sign in / Sign up

Export Citation Format

Share Document