Effect of nitrogen incorporation on electron emission from chemical vapor deposited diamond

1999 ◽  
Vol 17 (2) ◽  
pp. 734 ◽  
Author(s):  
M. Park ◽  
A. T. Sowers ◽  
C. Lizzul Rinne ◽  
R. Schlesser ◽  
L. Bergman ◽  
...  
Keyword(s):  
Electron Emission ◽  
Chemical Vapor ◽  
Nitrogen Incorporation ◽  
Chemical Vapor Deposited

Fabrication of Planar Diamond Electron Emitters for Flat Panel Displays

1999 ◽  
Vol 558 ◽  
Author(s):  
H. Kawamura ◽  
S. Kato ◽  
T. Maki ◽  
T. Kobayashi
Keyword(s):  
Electron Emission ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Driving Voltage ◽  
Effective Work ◽  
Chemical Vapor Deposited ◽  
Low Threshold ◽  
Electron Emitters ◽  
Planar Electron

ABSTRACTA planar electron emitter was fabricated employing chemical vapor deposited (CVD) diamond thin films. This device is composed of CVD diamond films selectively deposited on a pair of patterned Au/Cr films separated 2 micrometers from each other. When the driving voltage (Vd) was applied between the Au/Cr films, the extremely low threshold emission from diamond film was observed (Vd ∼ 10 V). Furthermore, by applying high voltage on anode screen placed above this device, part of emitted current was drawn to the anode and the luminescence from phosphors was clearly seen under Vd = 50V. The mechanism of electron emission from the diamond films used in this device was also discussed by comparing with the electron emission from isolated diamond particles. It was found that the effective work functions differ between the isolated particles and the continuous films. This result suggests a difference in the emission site of electrons.

Influence of pressure on nitrogen incorporation in ultraviolet chemical vapor deposited SiO2films

1993 ◽  
Vol 74 (9) ◽  
pp. 5672-5678 ◽  
Author(s):  
C. Debauche ◽  
C. Licoppe ◽  
P. Ossart ◽  
R. A. B. Devine ◽  
F. Rochet
Keyword(s):  
Chemical Vapor ◽  
Nitrogen Incorporation ◽  
Chemical Vapor Deposited

scholarly journals Recent Developments of Field-Emission Research. Highly Efficient Electron Emission from Chemical-Vapor-Deposited Single-Crystalline Diamond.

Hyomen Kagaku ◽  
2002 ◽  
Vol 23 (1) ◽  
pp. 31-37
Author(s):  
Toshimichi ITO ◽  
Tomokatsu WATANABE ◽  
Satoko FUKUMOTO ◽  
Satoshi MITANI ◽  
Tokuyuki TERAJI
Keyword(s):  
Field Emission ◽  
Electron Emission ◽  
Chemical Vapor ◽  
Single Crystalline ◽  
Highly Efficient ◽  
Chemical Vapor Deposited ◽  
Recent Developments

Stable secondary electron emission from chemical vapor deposited diamond films coated with alkali‐halides

1995 ◽  
Vol 66 (2) ◽  
pp. 242-244 ◽  
Author(s):  
G. T. Mearini ◽  
I. L. Krainsky ◽  
J. A. Dayton ◽  
Yaxin Wang ◽  
Christian A. Zorman ◽  
...  
Keyword(s):  
Electron Emission ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Alkali Halides ◽  
Chemical Vapor Deposited

Electron Emission Mechanism of Doped CVD Diamond Characterized Using Combined XPS/UPS/FES System

2006 ◽  
Vol 956 ◽  
Author(s):  
Hisato Yamaguchi ◽  
Ichitaro Saito ◽  
Yuki Kudo ◽  
Tomoaki Masuzawa ◽  
Takatoshi Yamada ◽  
...  
Keyword(s):  
Electron Emission ◽  
Anode Voltage ◽  
Natural Diamond ◽  
Chemical Vapor ◽  
Cvd Diamond ◽  
Threshold Field ◽  
Emission Mechanism ◽  
Chemical Vapor Deposited ◽  
Low Threshold ◽  
Successful Observation

ABSTRACTElectric field of less than 5 V/μm is enough to extract electrons from diamond, whereas field of one to two orders of magnitude higher is needed to extract electrons from metal emitter tips. Despite such low-threshold field, the difficulty in clarification of electron emission mechanism is the factor preventing diamond from being used in a practical use. Quite a few numbers of possible mechanisms were proposed to better understand the origin and properties of the observed emission. Most of these mechanisms were, however, based on the conventional I (Emission current)-V (Anode voltage) characteristics. Energy distribution of the field-emitted electrons is essential in direct clarification of the mechanism. In this study, combined XPS/UPS/FES system was used to characterize the electron emission mechanism of doped chemical vapor deposited (CVD) diamond. The results indicated successful observation of the origin of field-emitted electrons from doped CVD diamond comparison with natural diamond, used as a reference.

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