Highly efficient electron emission from diode-type plane emitters using chemical-vapor-deposited single-crystalline diamond

1998 ◽  
Vol 73 (25) ◽  
pp. 3739-3741 ◽  
Author(s):  
Toshimichi Ito ◽  
Masaki Nishimura ◽  
Akimitsu Hatta
Hyomen Kagaku ◽  
2002 ◽  
Vol 23 (1) ◽  
pp. 31-37
Author(s):  
Toshimichi ITO ◽  
Tomokatsu WATANABE ◽  
Satoko FUKUMOTO ◽  
Satoshi MITANI ◽  
Tokuyuki TERAJI

1999 ◽  
Vol 558 ◽  
Author(s):  
H. Kawamura ◽  
S. Kato ◽  
T. Maki ◽  
T. Kobayashi

ABSTRACTA planar electron emitter was fabricated employing chemical vapor deposited (CVD) diamond thin films. This device is composed of CVD diamond films selectively deposited on a pair of patterned Au/Cr films separated 2 micrometers from each other. When the driving voltage (Vd) was applied between the Au/Cr films, the extremely low threshold emission from diamond film was observed (Vd ∼ 10 V). Furthermore, by applying high voltage on anode screen placed above this device, part of emitted current was drawn to the anode and the luminescence from phosphors was clearly seen under Vd = 50V. The mechanism of electron emission from the diamond films used in this device was also discussed by comparing with the electron emission from isolated diamond particles. It was found that the effective work functions differ between the isolated particles and the continuous films. This result suggests a difference in the emission site of electrons.


Author(s):  
M. Park ◽  
A. T. Sowers ◽  
C. Lizzul Rinne ◽  
R. Schlesser ◽  
L. Bergman ◽  
...  

2015 ◽  
Vol 1734 ◽  
Author(s):  
A.L. Vikharev ◽  
A.B. Muchnikov ◽  
D.B. Radishev ◽  
V.A. Isaev ◽  
O.A. Ivanov ◽  
...  

ABSTRACTThe study of combined single-crystalline and polycrystalline chemical vapor deposited (CVD) diamond wafers is reported. Combined CVD diamond wafers up to 75 mm in diameter were grown, which consist of great number of single-crystalline diamond sections grafted in a polycrystalline diamond matrix. The grown combined CVD wafers were characterized by the Raman spectroscopy. It was shown that in the grafting process, the single- and polycrystalline areas of the combined wafer undergo insignificant stresses, which can be released during the thermal annealing process. Fabricated combined CVD diamond can be used in various applications that employ unique properties of diamond and potentially suitable for industrial use.


1994 ◽  
Vol 33 (Part 1, No. 11) ◽  
pp. 6312-6315 ◽  
Author(s):  
Nobuhiro Eimori ◽  
Yusuke Mori ◽  
Akimitsu Hatta ◽  
Toshimichi Ito ◽  
Akio Hiraki

1995 ◽  
Vol 66 (2) ◽  
pp. 242-244 ◽  
Author(s):  
G. T. Mearini ◽  
I. L. Krainsky ◽  
J. A. Dayton ◽  
Yaxin Wang ◽  
Christian A. Zorman ◽  
...  

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