High throughput electron lithography with the multiple aperture pixel by pixel enhancement of resolution concept

1998 ◽  
Vol 16 (6) ◽  
pp. 3177 ◽  
Author(s):  
P. Kruit
Keyword(s):  
High Throughput ◽  
Electron Lithography

High throughput electron lithography for integrated optoelectronic grating structures

1990 ◽  
Vol 11 (1-4) ◽  
pp. 375-378 ◽  
Author(s):  
S.J. Clements ◽  
R.S. Baulcomb ◽  
C.B. Rogers ◽  
A.P. Wright ◽  
A.S. Gozdz
Keyword(s):  
High Throughput ◽  
Electron Lithography

A High Throughput Electron Lithography System Using A Field Emission Gun

1989 ◽  
Author(s):  
W. B. Thompson ◽  
Y. Nakagawa ◽  
M. Hassel Shearer ◽  
H. Nakazawa ◽  
H. Takemura ◽  
...  
Keyword(s):  
Field Emission ◽  
High Throughput ◽  
Electron Lithography ◽  
Lithography System

Micropatterning of Permalloy Films by Electron Lithography

1976 ◽  
Vol 34 ◽  
pp. 448-449
Author(s):  
J. K. Maurin
Keyword(s):  
Electron Beam ◽  
Subsequent Development ◽  
Electron Optical System ◽  
Microelectronic Device ◽  
Magnetic Bubble ◽  
Control Beam ◽  
Photosensitive Material ◽  
Direct Exposure ◽  
Electron Lithography ◽  
Scanning Electron

Conductor, resistor, and dielectric patterns of microelectronic device are usually defined by exposure of a photosensitive material through a mask onto the device with subsequent development of the photoresist and chemical removal of the undesired materials. Standard optical techniques are limited and electron lithography provides several important advantages, including the ability to expose features as small as 1,000 Å, and direct exposure on the wafer with no intermediate mask. This presentation is intended to report how electron lithography was used to define the permalloy patterns which are used to manipulate domains in magnetic bubble memory devices.The electron optical system used in our experiment as shown in Fig. 1 consisted of a high resolution scanning electron microscope, a computer, and a high precision motorized specimen stage. The computer is appropriately interfaced to address the electron beam, control beam exposure, and move the specimen stage.

154: Integration of TPSA and High-Throughput Mass Spectrometry Data Improves Prostate Cancer Prediction

2007 ◽  
Vol 177 (4S) ◽  
pp. 52-53
Author(s):  
Stefano Ongarello ◽  
Eberhard Steiner ◽  
Regina Achleitner ◽  
Isabel Feuerstein ◽  
Birgit Stenzel ◽  
...  
Keyword(s):  
Prostate Cancer ◽  
Mass Spectrometry ◽  
High Throughput ◽  
Mass Spectrometry Data ◽  
Cancer Prediction
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