Submicrometer transmission mask fabricated by low-temperature SF[sub 6]/O[sub 2] reactive ion etching and focused ion beam

Author(s):  
H. Y. Sheng
2006 ◽  
Vol 26 (2-3) ◽  
pp. 164-168 ◽  
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G. Villanueva ◽  
J.A. Plaza ◽  
A. Sánchez-Amores ◽  
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Vol 10 (1) ◽  
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Guillermo Villanueva ◽  
Jose Antonio Plaza ◽  
Christopher A. Mills ◽  
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2008 ◽  
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pp. 035003 ◽  
Author(s):  
H X Qian ◽  
Wei Zhou ◽  
Jianmin Miao ◽  
Lennie E N Lim ◽  
X R Zeng

2010 ◽  
Vol 20 (8) ◽  
pp. 085009 ◽  
Author(s):  
N Chekurov ◽  
K Grigoras ◽  
L Sainiemi ◽  
A Peltonen ◽  
I Tittonen ◽  
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2012 ◽  
Vol 51 (8R) ◽  
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Yasuyuki Fukuda ◽  
Yasunori Saotome ◽  
Nobuyuki Nishiyama ◽  
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2012 ◽  
Vol 51 ◽  
pp. 086702 ◽  
Author(s):  
Yasuyuki Fukuda ◽  
Yasunori Saotome ◽  
Nobuyuki Nishiyama ◽  
Noriko Saidoh ◽  
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2007 ◽  
Vol 84 (5-8) ◽  
pp. 1215-1218 ◽  
Author(s):  
Maria Villarroya ◽  
Nuria Barniol ◽  
Cristina Martin ◽  
Francesc Pérez-Murano ◽  
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