Filter design methodology for defect detection in wafer inspection

1997 ◽  
Vol 15 (6) ◽  
pp. 2718 ◽  
Author(s):  
Robert J. Socha
Keyword(s):  
Defect Detection ◽  
Design Methodology ◽  
Filter Design ◽  
Wafer Inspection

scholarly journals Robust H∞ Loop Shaping Controller Synthesis for SISO Systems by Complex Modular Functions

2021 ◽  
Vol 26 (1) ◽  
pp. 21
Author(s):  
Ahmad Taher Azar ◽  
Fernando E. Serrano ◽  
Nashwa Ahmad Kamal
Keyword(s):  
Design Methodology ◽  
Closed Loop ◽  
Complex Analysis ◽  
Controller Design ◽  
Filter Design ◽  
Design Procedure ◽  
Elliptic Functions ◽  
Loop System ◽  
Closed Loop System ◽  
Loop Shaping

In this paper, a loop shaping controller design methodology for single input and a single output (SISO) system is proposed. The theoretical background for this approach is based on complex elliptic functions which allow a flexible design of a SISO controller considering that elliptic functions have a double periodicity. The gain and phase margins of the closed-loop system can be selected appropriately with this new loop shaping design procedure. The loop shaping design methodology consists of implementing suitable filters to obtain a desired frequency response of the closed-loop system by selecting appropriate poles and zeros by the Abel theorem that are fundamental in the theory of the elliptic functions. The elliptic function properties are implemented to facilitate the loop shaping controller design along with their fundamental background and contributions from the complex analysis that are very useful in the automatic control field. Finally, apart from the filter design, a PID controller loop shaping synthesis is proposed implementing a similar design procedure as the first part of this study.

Novel method of under-etch defect detection for contact layers based on Si substrate using optic wafer inspection tools

2007 ◽  
Author(s):  
Byoung-Ho Lee ◽  
Jin-Seo Choi ◽  
Soo-Bok Chin ◽  
Do-Hyun Cho ◽  
Chang-Lyong Song
Keyword(s):  
Defect Detection ◽  
Si Substrate ◽  
Wafer Inspection ◽  
Novel Method

An Enhanced Memetic Differential Evolution in Filter Design for Defect Detection in Paper Production

2008 ◽  
Vol 16 (4) ◽  
pp. 529-555 ◽  
Author(s):  
Ville Tirronen ◽  
Ferrante Neri ◽  
Tommi Kärkkäinen ◽  
Kirsi Majava ◽  
Tuomo Rossi
Keyword(s):  
Local Search ◽  
Differential Evolution ◽  
Defect Detection ◽  
High Performance ◽  
Filter Design ◽  
Industrial Process ◽  
Search Algorithms ◽  
Stochastic Local Search ◽  
Local Search Algorithms ◽  
Pivot Rules

This article proposes an Enhanced Memetic Differential Evolution (EMDE) for designing digital filters which aim at detecting defects of the paper produced during an industrial process. Defect detection is handled by means of two Gabor filters and their design is performed by the EMDE. The EMDE is a novel adaptive evolutionary algorithm which combines the powerful explorative features of Differential Evolution with the exploitative features of three local search algorithms employing different pivot rules and neighborhood generating functions. These local search algorithms are the Hooke Jeeves Algorithm, a Stochastic Local Search, and Simulated Annealing. The local search algorithms are adaptively coordinated by means of a control parameter that measures fitness distribution among individuals of the population and a novel probabilistic scheme. Numerical results confirm that Differential Evolution is an efficient evolutionary framework for the image processing problem under investigation and show that the EMDE performs well. As a matter of fact, the application of the EMDE leads to a design of an efficiently tailored filter. A comparison with various popular metaheuristics proves the effectiveness of the EMDE in terms of convergence speed, stagnation prevention, and capability in detecting solutions having high performance.

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