Evaluation of alignment accuracy in processed wafers and SiC masks on a scattered-light alignment system for x-ray aligners

1997 ◽  
Vol 15 (6) ◽  
pp. 2471 ◽  
Author(s):  
Tsutomu Miyatake
Keyword(s):  
Scattered Light ◽  
Alignment Accuracy ◽  
X Ray ◽  
Alignment System

Scattered-light alignment system using SiC mask for x-ray lithography

1997 ◽  
Author(s):  
Tsutomu Miyatake ◽  
Masaoki Hirose ◽  
Tsutomu Shoki ◽  
Ryo Ohkubo ◽  
Kuniaki Yamazaki
Keyword(s):  
Scattered Light ◽  
X Ray ◽  
Alignment System

Advanced X-Ray Alignment System

1986 ◽  
Author(s):  
B. S. Fay ◽  
W. T. Novak
Keyword(s):  
X Ray ◽  
Alignment System

X-Ray Lithography Alignment System

1984 ◽  
Author(s):  
B Fay ◽  
W T. Novak
Keyword(s):  
X Ray ◽  
Title X ◽  
Alignment System

Effect of Mechanical Alignment System on Assembly Accuracy

2000 ◽  
Author(s):  
Neville K. S. Lee ◽  
Grace H. Yu ◽  
Y. Zou ◽  
J. Y. Chen ◽  
Ajay Joneja
Keyword(s):  
Alignment Accuracy ◽  
Mechanical Alignment ◽  
Mechanical Assembly ◽  
Surface Waviness ◽  
Form Errors ◽  
Multi Stage ◽  
Assembly Accuracy ◽  
Alignment System ◽  
Simulation Based ◽  
Selection Of

Abstract Mechanical means of positioning are frequently used in mechanical assembly processes. However, very little attention has been paid to the selection of mechanical alignment systems (MAS) for assembly processes. Our analysis shows that if the MAS are not properly selected, the form errors as well surface waviness and roughness of the workpieces to be assembled can badly limit the level of accuracy achievable. A simulation-based methodology is described to study the alignment accuracy for multi-stage processes. Such cases are common, where fabrication operations are done on parts before they are assembled. The study shows that if the workpieces are aligned in the same orientation, using similar or identical MAS for the fabrication processes and assembly processes, then the effect of the form errors as well as surface waviness and roughness of the workpieces can be greatly suppressed.

Evaluation of an advanced submicron X-ray stepper (XRS 200): Pattern transfer and alignment accuracy

1991 ◽  
Vol 13 (1-4) ◽  
pp. 309-314 ◽  
Author(s):  
K. Simon ◽  
F. Gabeli ◽  
W. Rohrmoser ◽  
S. Seedorf ◽  
H.-U. Scheunemann ◽  
...  
Keyword(s):  
Alignment Accuracy ◽  
Pattern Transfer ◽  
X Ray

Automatic X-Ray Alignment System For Submicron VLSI Printing

1984 ◽  
Author(s):  
B Fay ◽  
W T. Novak ◽  
I Carlsson
Keyword(s):  
X Ray ◽  
Alignment System
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