Plasma reactive ion etching of 193 nm attenuated phase shift mask materials

1997 ◽  
Vol 15 (6) ◽  
pp. 2259 ◽  
Author(s):  
B. W. Smith
Keyword(s):  
Phase Shift ◽  
Reactive Ion Etching ◽  
Ion Etching ◽  
193 Nm ◽  
Phase Shift Mask

Study and improvement approach to 193-nm radiation damage of attenuated phase-shift mask

2010 ◽  
Author(s):  
Yoshifumi Sakamoto ◽  
Tomohito Hirose ◽  
Hitomi Tsukuda ◽  
Taichi Yamazaki ◽  
Yosuke Kojima ◽  
...  
Keyword(s):  
Phase Shift ◽  
Radiation Damage ◽  
193 Nm ◽  
Phase Shift Mask

Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography

2006 ◽  
Vol 45 (11) ◽  
pp. 8920-8924 ◽  
Author(s):  
Ji-Eun Lee ◽  
Hye-Young Kang ◽  
Dong-Soo Shin ◽  
Hee-Jun Jeong ◽  
Ilsin An ◽  
...  
Keyword(s):  
Phase Shift ◽  
193 Nm ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask

Error budget for a 193-nm complementary phase-shift mask

2002 ◽  
Author(s):  
Nicholas K. Eib ◽  
Olga Kobozeva ◽  
Chris Neville ◽  
Ebo H. Croffie
Keyword(s):  
Phase Shift ◽  
Error Budget ◽  
193 Nm ◽  
Phase Shift Mask

Reactive ion etching of 193-nm resist candidates: current platforms and future requirements

1998 ◽  
Author(s):  
Thomas I. Wallow ◽  
Phillip J. Brock ◽  
Richard A. Di Pietro ◽  
Robert D. Allen ◽  
Juliann Opitz ◽  
...  
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
193 Nm

Lateral shearing interferometer for phase-shift mask measurement at 193 nm

2002 ◽  
Author(s):  
Gerald Fuetterer ◽  
M. Lano ◽  
Norbert Lindlein ◽  
Johannes Schwider
Keyword(s):  
Phase Shift ◽  
Lateral Shearing Interferometer ◽  
Lateral Shearing ◽  
193 Nm ◽  
Phase Shift Mask

scholarly journals Phase-shift mask issues for 193-nm lithography

1994 ◽  
Author(s):  
Bruce W. Smith ◽  
Suleyman Turgut
Keyword(s):  
Phase Shift ◽  
193 Nm ◽  
Phase Shift Mask

Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes

2003 ◽  
Author(s):  
Jason Plumhoff ◽  
Chris Constantine ◽  
Jong Shin ◽  
B. Reelfs ◽  
Emmanuel Rausa ◽  
...  
Keyword(s):  
Phase Shift ◽  
193 Nm ◽  
Dry Etch ◽  
Phase Shift Mask

Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100-nm node

2002 ◽  
Author(s):  
Kyle Patterson ◽  
Lloyd C. Litt ◽  
John G. Maltabes ◽  
Greg P. Hughes ◽  
Trish Robertson ◽  
...  
Keyword(s):  
Phase Shift ◽  
193 Nm ◽  
Phase Shift Mask ◽  
Alternating Phase Shift Mask
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