Self-assembled monolayers exposed by metastable argon and metastable helium for neutral atom lithography and atomic beam imaging

1997 ◽  
Vol 15 (5) ◽  
pp. 1805 ◽  
Author(s):  
A. Bard
Keyword(s):  
Atomic Beam ◽  
Neutral Atom ◽  
Self Assembled Monolayers ◽  
Metastable Helium ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Neutral Atom Lithography ◽  
Atom Lithography

Self-Assembled Monolayers Exposed by Metastable Helium for Nano-Patterning: Octanethiol and Dodecanethiol

2003 ◽  
Vol 20 (11) ◽  
pp. 2064-2066 ◽  
Author(s):  
Ju Xin ◽  
Kurahashi Mitsunori ◽  
Suzuki Taku ◽  
Yamauchi Yasushi
Keyword(s):  
Self Assembled Monolayers ◽  
Metastable Helium ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Nano Patterning

Electrochemical behavior of self-assembled monolayers based on functionalized oligothiophenes

1998 ◽  
Vol 95 (6) ◽  
pp. 1339-1342 ◽  
Author(s):  
R. Michalitsch ◽  
A. El Kassmi ◽  
P. Lang ◽  
A. Yassar ◽  
F. Garnier
Keyword(s):  
Electrochemical Behavior ◽  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled

Imaging of patterned self-assembled monolayers by scanning photoelectron microscopy

2003 ◽  
Vol 104 ◽  
pp. 459-462 ◽  
Author(s):  
R. Klauser ◽  
M. Zharnikov ◽  
I.-H. Hong ◽  
S.-C. Wang ◽  
A. Gölzhäuser ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Scanning Photoelectron Microscopy ◽  
Self Assembled
Sign in / Sign up

Export Citation Format

Share Document