Plasma etching process development using in situ optical emission and ellipsometry

J. T. C. Lee

doi:10.1116/1.588821

Plasma etching process development using in situ optical emission and ellipsometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588821 ◽

1996 ◽

Vol 14 (5) ◽

pp. 3283 ◽

Cited By ~ 3

Author(s):

J. T. C. Lee

Keyword(s):

Plasma Etching ◽

Process Development ◽

Optical Emission ◽

Etching Process ◽

Plasma Etching Process

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In-situ detection method for wafer movement and micro-arc discharge around a wafer in plasma etching process using electrostatic chuck wafer stage with built-in acoustic emission sensor

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.03dc04 ◽

2014 ◽

Vol 53 (3S2) ◽

pp. 03DC04 ◽

Cited By ~ 1

Author(s):

Yuji Kasashima ◽

Tatsuo Tabaru ◽

Mitsuo Yasaka ◽

Yoshikazu Kobayashi ◽

Morito Akiyama ◽

...

Keyword(s):

Acoustic Emission ◽

Plasma Etching ◽

Detection Method ◽

Arc Discharge ◽

Etching Process ◽

Acoustic Emission Sensor ◽

Plasma Etching Process ◽

In Situ Detection

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In-situ particle monitor using virtual metrology system for measuring particle contamination during plasma etching process

2016 6th IEEE International Conference on Control System, Computing and Engineering (ICCSCE) ◽

10.1109/iccsce.2016.7893629 ◽

2016 ◽

Cited By ~ 3

Author(s):

Mohd Firdaus Abdullah ◽

Muhammad Khusairi Osman ◽

Noratika Mohammad Somari ◽

Adi Izhar Che Ani ◽

Sooria Pragash Rao S. Appanan ◽

...

Keyword(s):

Plasma Etching ◽

Etching Process ◽

Plasma Etching Process ◽

Virtual Metrology ◽

Particle Contamination ◽

Metrology System

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Modified PCA algorithm for the end point monitoring of the small open area plasma etching process using the whole optical emission spectra

10.1109/iccas.2007.4407024 ◽

2007 ◽

Author(s):

Kyounghoon Han ◽

Kun Joo Park ◽

Heeyeop Chae ◽

En Sup Yoon

Keyword(s):

Plasma Etching ◽

Emission Spectra ◽

Optical Emission ◽

Etching Process ◽

Open Area ◽

Plasma Etching Process ◽

End Point ◽

Pca Algorithm ◽

Optical Emission Spectra

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Plasma etching process monitoring with optical emission spectroscopy

2009 International Conference on Industrial Mechatronics and Automation ◽

10.1109/icima.2009.5156556 ◽

2009 ◽

Author(s):

Wang Wei ◽

Bi Junjie ◽

Zhao Junpeng

Keyword(s):

Process Monitoring ◽

Plasma Etching ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Etching Process ◽

Plasma Etching Process

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Automatic End Point Detection of Plasma Etching Process Using the Multi-Way PCA of the Whole Optical Emission Spectrum

2006 SICE-ICASE International Joint Conference ◽

10.1109/sice.2006.315668 ◽

2006 ◽

Author(s):

Kyounghoon Han ◽

Jae Lee ◽

Heeyeop Chae ◽

Kwang Han ◽

Kun Park ◽

...

Keyword(s):

Emission Spectrum ◽

Plasma Etching ◽

Optical Emission ◽

Etching Process ◽

Optical Emission Spectrum ◽

Plasma Etching Process ◽

End Point ◽

End Point Detection ◽

Point Detection

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Similarity Ratio Analysis for Early Stage Fault Detection with Optical Emission Spectrometer in Plasma Etching Process

PLoS ONE ◽

10.1371/journal.pone.0095679 ◽

2014 ◽

Vol 9 (4) ◽

pp. e95679 ◽

Cited By ~ 2

Author(s):

Jie Yang ◽

Conor McArdle ◽

Stephen Daniels

Keyword(s):

Fault Detection ◽

Plasma Etching ◽

Early Stage ◽

Optical Emission ◽

Etching Process ◽

Ratio Analysis ◽

Plasma Etching Process ◽

Similarity Ratio ◽

Optical Emission Spectrometer

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Silicon Micro-Channel Definition via ICP-RIE Plasma Etching Process Using Different Aluminum Hardmasks

Journal of Microelectromechanical Systems ◽

10.1109/jmems.2021.3088640 ◽

2021 ◽

pp. 1-7

Author(s):

Hugo S. Alvarez ◽

Frederico H. Cioldin ◽

Audrey R. Silva ◽

Luana C. J. Espinola ◽

Alfredo R. Vaz ◽

...

Keyword(s):

Plasma Etching ◽

Etching Process ◽

Micro Channel ◽

Plasma Etching Process

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Plasma etching process of AIN/Mo and Moly for CMOS compatible MEMS devices

2012 IEEE 14th Electronics Packaging Technology Conference (EPTC) ◽

10.1109/eptc.2012.6507182 ◽

2012 ◽

Author(s):

Wei Deng ◽

J. S. B. W. T. de xian

Keyword(s):

Plasma Etching ◽

Etching Process ◽

Mems Devices ◽

Plasma Etching Process ◽

Cmos Compatible

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Characterization of the CH4/H2/Ar high density plasma etching process for HgCdTe

Journal of Electronic Materials ◽

10.1007/s11664-999-0231-7 ◽

1999 ◽

Vol 28 (4) ◽

pp. 347-354 ◽

Cited By ~ 28

Author(s):

C. R. Eddy ◽

D. Leonhardt ◽

V. A. Shamamian ◽

J. R. Meyer ◽

C. A. Hoffman ◽

...

Keyword(s):

Plasma Etching ◽

High Density ◽

Etching Process ◽

Plasma Etching Process ◽

Density Plasma

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Development of the Silicon Through Anisotropic Plasma Etching Process

2021 IEEE Conference of Russian Young Researchers in Electrical and Electronic Engineering (ElConRus) ◽

10.1109/elconrus51938.2021.9396279 ◽

2021 ◽

Author(s):

Vladislav V. Paramonov ◽

Mikhail G. Putrya ◽

Tatiana V. Osipova

Keyword(s):

Plasma Etching ◽

Anisotropic Plasma ◽

Etching Process ◽

Plasma Etching Process

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