Automatic End Point Detection of Plasma Etching Process Using the Multi-Way PCA of the Whole Optical Emission Spectrum

2006 ◽  
Author(s):  
Kyounghoon Han ◽  
Jae Lee ◽  
Heeyeop Chae ◽  
Kwang Han ◽  
Kun Park ◽  
...  
Keyword(s):  
Emission Spectrum ◽  
Plasma Etching ◽  
Optical Emission ◽  
Etching Process ◽  
Optical Emission Spectrum ◽  
Plasma Etching Process ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

Grazing angle optical emission interferometry for end‐point detection

1991 ◽  
Vol 58 (3) ◽  
pp. 240-242 ◽  
Author(s):  
David Angell ◽  
Gottlieb S. Oehrlein
Keyword(s):  
Grazing Angle ◽  
Optical Emission ◽  
End Point ◽  
End Point Detection ◽  
Point Detection

Monitoring of Sidewall Spacer Etch by Optical Emission Spectroscopy and Mass Spectroscopy

1997 ◽  
Vol 502 ◽  
Author(s):  
K. Min ◽  
J. J. Chambers ◽  
G. N. Parsons ◽  
J. R. Hauser
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Electron Cyclotron Resonance ◽  
Optical Emission ◽  
Cross Sectional ◽  
End Point ◽  
Selective Etch ◽  
End Point Detection ◽  
Point Detection ◽  
Sectional Analysis

ABSTRACTSelective etch of SiO2/poly Si in a high density CF4+D2 plasma generated by ECR (Electron Cyclotron Resonance) system was studied. The end point detection of the SiO2 sidewall spacer etch was monitored using optical emission spectroscopy and mass spectrometer. SEM cross sectional analysis was conducted to confirm the end point detection and spacer formation.

Sign in / Sign up

Export Citation Format

Share Document