Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition

O. Ambacher

doi:10.1116/1.588793

Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588793 ◽

1996 ◽

Vol 14 (6) ◽

pp. 3532 ◽

Cited By ~ 232

Author(s):

O. Ambacher

Keyword(s):

Thermal Stability ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Organic Chemical ◽

Group Iii ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Recent progress in metal-organic chemical vapor deposition of $\left( 000\bar{1} \right)$ N-polar group-III nitrides

Semiconductor Science and Technology ◽

10.1088/0268-1242/29/11/113001 ◽

2014 ◽

Vol 29 (11) ◽

pp. 113001 ◽

Cited By ~ 101

Author(s):

Stacia Keller ◽

Haoran Li ◽

Matthew Laurent ◽

Yanling Hu ◽

Nathan Pfaff ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Recent Progress ◽

Chemical Vapor ◽

Group Iii Nitrides ◽

Organic Chemical ◽

Polar Group ◽

Group Iii ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Effect of a Ti capping layer on thermal stability of NiSi formed from Ni thin films deposited by metal–organic chemical vapor deposition using a Ni(iPr-DAD)2precursor

Japanese Journal of Applied Physics ◽

10.7567/jjap.54.025501 ◽

2015 ◽

Vol 54 (2) ◽

pp. 025501 ◽

Cited By ~ 1

Author(s):

Jingyu Park ◽

Heeyoung Jeon ◽

Hyunjung Kim ◽

Woochool Jang ◽

Chunho Kang ◽

...

Keyword(s):

Thin Films ◽

Thermal Stability ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Capping Layer ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Thermal Stability Of

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Thermal Stability of HfO2Films Fabricated by Metal Organic Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.47.31 ◽

2008 ◽

Vol 47 (1) ◽

pp. 31-34 ◽

Cited By ~ 1

Author(s):

Yoshitaka Nagasato ◽

Yoshitaka Iwazaki ◽

Masahiko Hasumi ◽

Tomo Ueno ◽

Koichi Kuroiwa

Keyword(s):

Thermal Stability ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Thermal Stability Of

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Influences of group-III source preflow on the polarity, optical, and structural properties of GaN grown on nitridated sapphire substrates by metal-organic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.4916243 ◽

2015 ◽

Vol 117 (12) ◽

pp. 125305 ◽

Cited By ~ 7

Author(s):

Chengguo Li ◽

Hongfei Liu ◽

Soo Jin Chua

Keyword(s):

Chemical Vapor Deposition ◽

Structural Properties ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Group Iii ◽

Sapphire Substrates ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Thermal stability of an InAlN/GaN heterostructure grown on silicon by metal-organic chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.4937902 ◽

2015 ◽

Vol 118 (23) ◽

pp. 235705 ◽

Cited By ~ 5

Author(s):

Arata Watanabe ◽

Joseph J. Freedsman ◽

Yuya Urayama ◽

Dennis Christy ◽

Takashi Egawa

Keyword(s):

Thermal Stability ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Gan Heterostructure ◽

Organic Chemical Vapor Deposition ◽

Thermal Stability Of

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NUMERICAL VISUALIZATION OF THERMAL FLOW STRUCTURE AND CONCENTRATION CONTOURS IN METAL ORGANIC CHEMICAL VAPOR DEPOSITION REACTORS

Journal of Flow Visualization and Image Processing ◽

10.1615/jflowvisimageproc.v7.i1.20 ◽

2000 ◽

Vol 7 (1) ◽

pp. 12

Author(s):

R. Y. Tzong ◽

C. Y. Soong

Keyword(s):

Chemical Vapor Deposition ◽

Flow Structure ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Thermal Flow ◽

Numerical Visualization ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Laser‐Assisted Metal–Organic Chemical Vapor Deposition of Gallium Nitride

physica status solidi (RRL) - Rapid Research Letters ◽

10.1002/pssr.202170024 ◽

2021 ◽

Vol 15 (6) ◽

pp. 2170024

Author(s):

Yuxuan Zhang ◽

Zhaoying Chen ◽

Kaitian Zhang ◽

Zixuan Feng ◽

Hongping Zhao

Keyword(s):

Gallium Nitride ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Growth-Etch Metal–Organic Chemical Vapor Deposition Approach of WS2 Atomic Layers

ACS Nano ◽

10.1021/acsnano.0c05394 ◽

2020 ◽

Author(s):

Assael Cohen ◽

Avinash Patsha ◽

Pranab K. Mohapatra ◽

Miri Kazes ◽

Kamalakannan Ranganathan ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Vertical β-Ga2O3 field plate Schottky barrier diode from metal-organic chemical vapor deposition

Applied Physics Letters ◽

10.1063/5.0047821 ◽

2021 ◽

Vol 118 (16) ◽

pp. 162109

Author(s):

Esmat Farzana ◽

Fikadu Alema ◽

Wan Ying Ho ◽

Akhil Mauze ◽

Takeki Itoh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

Vapor Deposition ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Organic Chemical ◽

Field Plate ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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The crystallographic quality and band-edge transition of as-deposited PALE AlN films via metal organic chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-020-05070-3 ◽

2021 ◽

Author(s):

Mohd Nazri Abd Rahman ◽

Ahmad Shuhaimi ◽

Ooi Chong Seng ◽

Gary Tan ◽

Afiq Anuar ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Band Edge ◽

Organic Chemical ◽

Metal Organic ◽

Organic Chemical Vapor Deposition ◽

Band Edge Transition

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