Ellipsometry study of the nucleation of Si epitaxy by electron cyclotron resonance plasma chemical vapor deposition

M. Li

doi:10.1116/1.588000

Ellipsometry study of the nucleation of Si epitaxy by electron cyclotron resonance plasma chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.588000 ◽

1995 ◽

Vol 13 (1) ◽

pp. 105 ◽

Cited By ~ 12

Author(s):

M. Li

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Si Epitaxy ◽

Resonance Plasma

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Radical Fluxes in Electron Cyclotron Resonance Plasma Chemical Vapor Deposition of Amorphous Silicon

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.5965 ◽

1995 ◽

Vol 34 (Part 1, No. 11) ◽

pp. 5965-5970 ◽

Cited By ~ 3

Author(s):

Mei Zhang ◽

Yoshikazu Nakayama

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Study on the electron cyclotron resonance plasma chemical vapor deposition of carbon nanotubes

Materials Science and Engineering B ◽

10.1016/j.mseb.2007.03.008 ◽

2007 ◽

Vol 140 (1-2) ◽

pp. 44-47

Author(s):

Zhi Wang ◽

Dechun Ba ◽

Peijiang Cao ◽

ChunhongYu ◽

Ji Liang

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Electron cyclotron resonance plasma chemical vapor deposition for rugate film manufacturing

10.1117/12.192121 ◽

1994 ◽

Cited By ~ 1

Author(s):

Pavel V. Bulkin ◽

Pieter L. Swart ◽

Beatrys M. Lacquet

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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SiCN alloys deposited by electron cyclotron resonance plasma chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.117887 ◽

1996 ◽

Vol 69 (6) ◽

pp. 773-775 ◽

Cited By ~ 89

Author(s):

F. J. Gómez ◽

P. Prieto ◽

E. Elizalde ◽

J. Piqueras

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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The Optimization of the Deposition Variables for High Photoconductivity a-Si:H Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.6959 ◽

1998 ◽

Vol 37 (Part 1, No. 12B) ◽

pp. 6959-5964

Author(s):

Moonsang Kang ◽

Yongseo Koo ◽

Chul An

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Electron Cyclotron Resonance Plasma ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Preparation of TiN Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.3558 ◽

1991 ◽

Vol 30 (Part 1, No. 12B) ◽

pp. 3558-3561 ◽

Cited By ~ 17

Author(s):

Takashi Akahori ◽

Akira Tanihara ◽

Masashi Tano

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Tin Films ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Role of ions in formation of amorphous Si:H network in electron cyclotron resonance plasma chemical vapor deposition

Journal of Non-Crystalline Solids ◽

10.1016/s0022-3093(05)80209-1 ◽

1991 ◽

Vol 137-138 ◽

pp. 669-672 ◽

Cited By ~ 5

Author(s):

Yoshikazu Nakayama ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Hiroshi Imamura ◽

Takao Kawamura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Behavior of charged particles in an electron cyclotron resonance plasma chemical vapor deposition reactor

Applied Physics Letters ◽

10.1063/1.103892 ◽

1990 ◽

Vol 57 (22) ◽

pp. 2297-2299 ◽

Cited By ~ 4

Author(s):

Yoshikazu Nakayama ◽

Mitsuru Kondoh ◽

Kohji Hitsuishi ◽

Mei Zhang ◽

Takao Kawamura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Charged Particles ◽

Chemical Vapor ◽

Plasma Chemical ◽

Chemical Vapor Deposition Reactor ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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Low-pressure deposition of diamond by electron cyclotron resonance microwave plasma chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(99)00791-5 ◽

2000 ◽

Vol 211 (1-4) ◽

pp. 216-219 ◽

Cited By ~ 8

Author(s):

M.J Chiang ◽

B.H Lung ◽

M.H Hon

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Microwave Plasma ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Microwave

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Low‐Temperature Si Epitaxial Growth by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2069532 ◽

1992 ◽

Vol 139 (7) ◽

pp. 1983-1988 ◽

Cited By ~ 3

Author(s):

Naoki Kasai ◽

Nobuhiro Endo

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Epitaxial Growth ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Electron Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Resonance Plasma

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