Molecular-beam epitaxy growth of high-performance midinfrared diode lasers

Author(s):  
G. W. Turner
Author(s):  
C. L. Canedy ◽  
W. W. Bewley ◽  
G. I. Boishin ◽  
C. S. Kim ◽  
I. Vurgaftman ◽  
...  

2011 ◽  
Vol 32 (10) ◽  
pp. 103002 ◽  
Author(s):  
Yu Zhang ◽  
Guowei Wang ◽  
Bao Tang ◽  
Yingqiang Xu ◽  
Yun Xu ◽  
...  

2009 ◽  
Vol 1194 ◽  
Author(s):  
Dmitri Lubyshev ◽  
Joel M. Fastenau ◽  
Ying Wu ◽  
Andrew Synder ◽  
Amy W. K. Liu ◽  
...  

AbstractWe report on a direct epitaxial growth approach for the heterogeneous integration of high speed III-V devices with Si CMOS logic on a common Si substrate. InP-based heterojunction bipolar transistor (HBTs) structures were successfully grown on patterned Si-on-Lattice-Engineered-Substrate (SOLES) substrates using molecular beam epitaxy. DC and RF performance similar to those grown on lattice-matched InP were achieved in growth windows as small as 15×15μm2. This truly planar approach allows tight device placement with InP-HBTs to Si CMOS transistors separation as small as 2.5 μm, and the use of standard wafer level multilayer interconnects. A high speed, low power dissipation differential amplifier was designed and fabricated, demonstrating the feasibility of using this approach for high performance mixed signal circuits such as ADCs and DACs.


2007 ◽  
Vol 50 (2-3) ◽  
pp. 284-290 ◽  
Author(s):  
Yong Chang ◽  
C. Fulk ◽  
J. Zhao ◽  
C.H. Grein ◽  
S. Sivananthan

1992 ◽  
Vol 2 (9) ◽  
pp. 1727-1738 ◽  
Author(s):  
A. Accard ◽  
F. Brillouet ◽  
E. Duda ◽  
B. Fernier ◽  
G. Gelly ◽  
...  

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