Erratum: ‘‘Proximity effect correction data processing system for electron beam lithography’’ [J. Vac. Sci. Technol. B 10, 133 (1992)]

1993 ◽  
Vol 11 (5) ◽  
pp. 1906
Author(s):  
W. Lu
Keyword(s):  
Electron Beam ◽  
Data Processing ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Processing System ◽  
Data Processing System ◽  
Proximity Effect Correction

Fabrication of Si photonic waveguides by electron beam lithography using improved proximity effect correction

2020 ◽  
Vol 59 (12) ◽  
pp. 126502
Author(s):  
Moataz Eissa ◽  
Takuya Mitarai ◽  
Tomohiro Amemiya ◽  
Yasuyuki Miyamoto ◽  
Nobuhiko Nishiyama
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Photonic Waveguides ◽  
Proximity Effect Correction

Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method

1997 ◽  
Vol 36 (Part 1, No. 12B) ◽  
pp. 7546-7551 ◽  
Author(s):  
Takashi Kamikubo ◽  
Takayuki Abe ◽  
Susumu Oogi ◽  
Hiroto Anze ◽  
Mitsuko Shimizu ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Correction Method ◽  
Proximity Effect Correction

Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography

2004 ◽  
Vol 43 (6B) ◽  
pp. 3762-3766 ◽  
Author(s):  
Kozo Ogino ◽  
Hiromi Hoshino ◽  
Yasuhide Machida ◽  
Morimi Osawa ◽  
Hiroshi Arimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Proximity Effect ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Multilayer Structures ◽  
Proximity Effect Correction
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